Fabrication of Mo nano patterns using nano transfer printing with poly vinyl alcohol mold

Ki Yeon Yang, Kyung Min Yoon, Kang Soo Han, Kyung Jae Byun, Heon Lee

Research output: Contribution to journalArticle

Abstract

Nanofabrication is an essential process throughout industry. Technologies that produce general nanofabrication, such as e-beam lithography, dip-pen lithography, DUV lithography, immersion lithography, and laser interference lithography, have drawbacks including complicated processes, low throughput, and high costs, whereas nano-transfer printing (nTP) is inexpensive, simple, and can produce patterns on non-plane substrates and multilayer structures. In general nTP, the coherency of gold-deposited stamps is strengthened by using SAM treatment on substrates, so the gold patterns are transferred from stamps to substrates. However, it is hard to apply to transfer other metallic materials, and the existing nTP process requires a complicated surface treatment. Therefore, it is necessary to simplify the nTP technology to obtain an easy and simple method for fabricating metal patterns. In this paper, asnTP process with poly vinyl alcohol (PVA) mold was proposed without any chemical treatment. At first, a PVA mold was duplicated from the master mold. Then, a Mo layer, with a thickness of 20 nm, was deposited on the PVA mold. The Mo deposited PVA mold was put on the Si wafer substrate, and nTP process progressed. After the nTP process, the PVA mold was removed using DI water, and transferred Mo nano patterns were characterized by a Scanning electron micrograph (SEM) and Energy Dispersive spectroscopy (EDS).

Original languageEnglish
Pages (from-to)224-227
Number of pages4
JournalKorean Journal of Materials Research
Volume19
Issue number4
DOIs
Publication statusPublished - 2009

Keywords

  • Mo nano pattern
  • Nano-transfer printing (nTP)
  • Poly vinyl alcohol (PVA)

ASJC Scopus subject areas

  • Materials Science(all)

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