Abstract
Nanofabrication is an essential process throughout industry. Technologies that produce general nanofabrication, such as e-beam lithography, dip-pen lithography, DUV lithography, immersion lithography, and laser interference lithography, have drawbacks including complicated processes, low throughput, and high costs, whereas nano-transfer printing (nTP) is inexpensive, simple, and can produce patterns on non-plane substrates and multilayer structures. In general nTP, the coherency of gold-deposited stamps is strengthened by using SAM treatment on substrates, so the gold patterns are transferred from stamps to substrates. However, it is hard to apply to transfer other metallic materials, and the existing nTP process requires a complicated surface treatment. Therefore, it is necessary to simplify the nTP technology to obtain an easy and simple method for fabricating metal patterns. In this paper, asnTP process with poly vinyl alcohol (PVA) mold was proposed without any chemical treatment. At first, a PVA mold was duplicated from the master mold. Then, a Mo layer, with a thickness of 20 nm, was deposited on the PVA mold. The Mo deposited PVA mold was put on the Si wafer substrate, and nTP process progressed. After the nTP process, the PVA mold was removed using DI water, and transferred Mo nano patterns were characterized by a Scanning electron micrograph (SEM) and Energy Dispersive spectroscopy (EDS).
| Original language | English |
|---|---|
| Pages (from-to) | 224-227 |
| Number of pages | 4 |
| Journal | Korean Journal of Materials Research |
| Volume | 19 |
| Issue number | 4 |
| DOIs | |
| Publication status | Published - 2009 Aug 18 |
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Keywords
- Mo nano pattern
- Nano-transfer printing (nTP)
- Poly vinyl alcohol (PVA)
ASJC Scopus subject areas
- Materials Science(all)
Cite this
Fabrication of Mo nano patterns using nano transfer printing with poly vinyl alcohol mold. / Yang, Ki Yeon; Yoon, Kyung Min; Han, Kang Soo; Byun, Kyung Jae; Lee, Heon.
In: Korean Journal of Materials Research, Vol. 19, No. 4, 18.08.2009, p. 224-227.Research output: Contribution to journal › Article
}
TY - JOUR
T1 - Fabrication of Mo nano patterns using nano transfer printing with poly vinyl alcohol mold
AU - Yang, Ki Yeon
AU - Yoon, Kyung Min
AU - Han, Kang Soo
AU - Byun, Kyung Jae
AU - Lee, Heon
PY - 2009/8/18
Y1 - 2009/8/18
N2 - Nanofabrication is an essential process throughout industry. Technologies that produce general nanofabrication, such as e-beam lithography, dip-pen lithography, DUV lithography, immersion lithography, and laser interference lithography, have drawbacks including complicated processes, low throughput, and high costs, whereas nano-transfer printing (nTP) is inexpensive, simple, and can produce patterns on non-plane substrates and multilayer structures. In general nTP, the coherency of gold-deposited stamps is strengthened by using SAM treatment on substrates, so the gold patterns are transferred from stamps to substrates. However, it is hard to apply to transfer other metallic materials, and the existing nTP process requires a complicated surface treatment. Therefore, it is necessary to simplify the nTP technology to obtain an easy and simple method for fabricating metal patterns. In this paper, asnTP process with poly vinyl alcohol (PVA) mold was proposed without any chemical treatment. At first, a PVA mold was duplicated from the master mold. Then, a Mo layer, with a thickness of 20 nm, was deposited on the PVA mold. The Mo deposited PVA mold was put on the Si wafer substrate, and nTP process progressed. After the nTP process, the PVA mold was removed using DI water, and transferred Mo nano patterns were characterized by a Scanning electron micrograph (SEM) and Energy Dispersive spectroscopy (EDS).
AB - Nanofabrication is an essential process throughout industry. Technologies that produce general nanofabrication, such as e-beam lithography, dip-pen lithography, DUV lithography, immersion lithography, and laser interference lithography, have drawbacks including complicated processes, low throughput, and high costs, whereas nano-transfer printing (nTP) is inexpensive, simple, and can produce patterns on non-plane substrates and multilayer structures. In general nTP, the coherency of gold-deposited stamps is strengthened by using SAM treatment on substrates, so the gold patterns are transferred from stamps to substrates. However, it is hard to apply to transfer other metallic materials, and the existing nTP process requires a complicated surface treatment. Therefore, it is necessary to simplify the nTP technology to obtain an easy and simple method for fabricating metal patterns. In this paper, asnTP process with poly vinyl alcohol (PVA) mold was proposed without any chemical treatment. At first, a PVA mold was duplicated from the master mold. Then, a Mo layer, with a thickness of 20 nm, was deposited on the PVA mold. The Mo deposited PVA mold was put on the Si wafer substrate, and nTP process progressed. After the nTP process, the PVA mold was removed using DI water, and transferred Mo nano patterns were characterized by a Scanning electron micrograph (SEM) and Energy Dispersive spectroscopy (EDS).
KW - Mo nano pattern
KW - Nano-transfer printing (nTP)
KW - Poly vinyl alcohol (PVA)
UR - http://www.scopus.com/inward/record.url?scp=68549110573&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=68549110573&partnerID=8YFLogxK
U2 - 10.3740/MRSK.2009.19.4.224
DO - 10.3740/MRSK.2009.19.4.224
M3 - Article
AN - SCOPUS:68549110573
VL - 19
SP - 224
EP - 227
JO - Korean Journal of Materials Research
JF - Korean Journal of Materials Research
SN - 1225-0562
IS - 4
ER -