Fabrication of nano-hole array patterns on transparent conducting oxide layer using thermally curable nanoimprint lithography

Kyeong Jae Byeon, Seon Yong Hwang, Heon Lee

Research output: Contribution to journalArticle

11 Citations (Scopus)

Abstract

A two-dimensional, periodic array of nano-sized holes was fabricated in an indium tin oxide (ITO) layer, deposited onto a glass substrate with nanoimprint lithography. As a result of a thermally curing imprint process, hole array patterns with a diameter of 130 nm and a pitch of 520 nm were formed on the ITO surface with a near zero residual layer. After inductively coupled plasma etching process of ITO using the imprinted polymer pattern as an etch mask, a tapered-hole array pattern was fabricated on the ITO layer, thereby producing a prominent diffusion phenomenon in the near ultraviolet region.

Original languageEnglish
Pages (from-to)830-833
Number of pages4
JournalMicroelectronic Engineering
Volume85
Issue number5-6
DOIs
Publication statusPublished - 2008 May 1

Fingerprint

Nanoimprint lithography
Tin oxides
indium oxides
Indium
Oxides
tin oxides
lithography
conduction
Fabrication
fabrication
oxides
Plasma etching
Inductively coupled plasma
plasma etching
curing
Curing
Masks
Polymers
masks
Glass

Keywords

  • Indium tin oxide (ITO)
  • Nanoimprint lithography (NIL)
  • Patterned transparent electrode
  • Photonic crystals
  • Transparent conducting oxide (TCO) layer

ASJC Scopus subject areas

  • Hardware and Architecture
  • Electrical and Electronic Engineering
  • Electronic, Optical and Magnetic Materials
  • Surfaces, Coatings and Films
  • Atomic and Molecular Physics, and Optics

Cite this

Fabrication of nano-hole array patterns on transparent conducting oxide layer using thermally curable nanoimprint lithography. / Byeon, Kyeong Jae; Hwang, Seon Yong; Lee, Heon.

In: Microelectronic Engineering, Vol. 85, No. 5-6, 01.05.2008, p. 830-833.

Research output: Contribution to journalArticle

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