Fabrication of nano-hole array patterns on transparent conducting oxide layer using thermally curable nanoimprint lithography

Kyeong Jae Byeon; Seon Yong Hwang; Heon Lee

doi:10.1016/j.mee.2007.12.078

Fabrication of nano-hole array patterns on transparent conducting oxide layer using thermally curable nanoimprint lithography

Kyeong Jae Byeon, Seon Yong Hwang, Heon Lee

Department of Materials Science and Engineering

Research output: Contribution to journal › Article › peer-review

12 Citations (Scopus)

Abstract

A two-dimensional, periodic array of nano-sized holes was fabricated in an indium tin oxide (ITO) layer, deposited onto a glass substrate with nanoimprint lithography. As a result of a thermally curing imprint process, hole array patterns with a diameter of 130 nm and a pitch of 520 nm were formed on the ITO surface with a near zero residual layer. After inductively coupled plasma etching process of ITO using the imprinted polymer pattern as an etch mask, a tapered-hole array pattern was fabricated on the ITO layer, thereby producing a prominent diffusion phenomenon in the near ultraviolet region.

Original language	English
Pages (from-to)	830-833
Number of pages	4
Journal	Microelectronic Engineering
Volume	85
Issue number	5-6
DOIs	https://doi.org/10.1016/j.mee.2007.12.078
Publication status	Published - 2008 May

Keywords

Indium tin oxide (ITO)
Nanoimprint lithography (NIL)
Patterned transparent electrode
Photonic crystals
Transparent conducting oxide (TCO) layer

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials
Atomic and Molecular Physics, and Optics
Condensed Matter Physics
Surfaces, Coatings and Films
Electrical and Electronic Engineering

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10.1016/j.mee.2007.12.078

Cite this

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title = "Fabrication of nano-hole array patterns on transparent conducting oxide layer using thermally curable nanoimprint lithography",

abstract = "A two-dimensional, periodic array of nano-sized holes was fabricated in an indium tin oxide (ITO) layer, deposited onto a glass substrate with nanoimprint lithography. As a result of a thermally curing imprint process, hole array patterns with a diameter of 130 nm and a pitch of 520 nm were formed on the ITO surface with a near zero residual layer. After inductively coupled plasma etching process of ITO using the imprinted polymer pattern as an etch mask, a tapered-hole array pattern was fabricated on the ITO layer, thereby producing a prominent diffusion phenomenon in the near ultraviolet region.",

keywords = "Indium tin oxide (ITO), Nanoimprint lithography (NIL), Patterned transparent electrode, Photonic crystals, Transparent conducting oxide (TCO) layer",

author = "Byeon, {Kyeong Jae} and Hwang, {Seon Yong} and Heon Lee",

note = "Funding Information: This study was supported by the basic research program of the Korea Science & Engineering Foundation (Grant No. R01-2006-000-10904-0) and a Grant from the Center for Nano-scale Mechatronics and Manufacturing, one of the 21st Century Frontier Research Programs, which are supported by the Ministry of Science and Technology, Korea.",

year = "2008",

month = may,

doi = "10.1016/j.mee.2007.12.078",

language = "English",

volume = "85",

pages = "830--833",

journal = "Microelectronic Engineering",

issn = "0167-9317",

publisher = "Elsevier",

number = "5-6",

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T1 - Fabrication of nano-hole array patterns on transparent conducting oxide layer using thermally curable nanoimprint lithography

AU - Byeon, Kyeong Jae

AU - Hwang, Seon Yong

AU - Lee, Heon

N1 - Funding Information: This study was supported by the basic research program of the Korea Science & Engineering Foundation (Grant No. R01-2006-000-10904-0) and a Grant from the Center for Nano-scale Mechatronics and Manufacturing, one of the 21st Century Frontier Research Programs, which are supported by the Ministry of Science and Technology, Korea.

PY - 2008/5

Y1 - 2008/5

N2 - A two-dimensional, periodic array of nano-sized holes was fabricated in an indium tin oxide (ITO) layer, deposited onto a glass substrate with nanoimprint lithography. As a result of a thermally curing imprint process, hole array patterns with a diameter of 130 nm and a pitch of 520 nm were formed on the ITO surface with a near zero residual layer. After inductively coupled plasma etching process of ITO using the imprinted polymer pattern as an etch mask, a tapered-hole array pattern was fabricated on the ITO layer, thereby producing a prominent diffusion phenomenon in the near ultraviolet region.

AB - A two-dimensional, periodic array of nano-sized holes was fabricated in an indium tin oxide (ITO) layer, deposited onto a glass substrate with nanoimprint lithography. As a result of a thermally curing imprint process, hole array patterns with a diameter of 130 nm and a pitch of 520 nm were formed on the ITO surface with a near zero residual layer. After inductively coupled plasma etching process of ITO using the imprinted polymer pattern as an etch mask, a tapered-hole array pattern was fabricated on the ITO layer, thereby producing a prominent diffusion phenomenon in the near ultraviolet region.

KW - Indium tin oxide (ITO)

KW - Nanoimprint lithography (NIL)

KW - Patterned transparent electrode

KW - Photonic crystals

KW - Transparent conducting oxide (TCO) layer

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DO - 10.1016/j.mee.2007.12.078

M3 - Article

AN - SCOPUS:44349135685

SN - 0167-9317

VL - 85

SP - 830

EP - 833

JO - Microelectronic Engineering

JF - Microelectronic Engineering

IS - 5-6

ER -

Fabrication of nano-hole array patterns on transparent conducting oxide layer using thermally curable nanoimprint lithography

Abstract

Keywords

ASJC Scopus subject areas

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