Fabrication of nano-porous structure on silicon substrate using nanoimprint lithography with an anodic aluminum oxide nano-template

A polymer template, which has an array of 300 nm diameter pillar patterns, was fabricated by hot embossing method using anodic aluminum oxide (AAO) template as an embossing stamp. After depositing the thin layer of silicon oxide and coating of anti-adhesion monolayer of organic film on silicon oxide, UV nanoimprint lithography was carried out with the polymer template. As a result, nano-pore array pattern, identical to anodic aluminum oxide pattern, was fabricated on silicon substrate. Residual layer of imprinted nano-pore array pattern was removed by oxygen plasma etch and thin film of Au/Ti was deposited. After lift-off process, Au/Ti dot array was also fabricated on silicon substrate.