Abstract
UV nano imprint lithography (UV NIL) that uses a monomer based UV curable monomer resin is proposed as a method of imprinting at low temperature and pressure. The fabrication of high fidelity patterns on a topographical substrate is a formidable challenge. To accomplish this, the use of bi-layer nano imprint lithography, which involves the use of an easily removable under-layer and an imprinted pattern, is proposed. We hypothesized that by etching the under layer by oxygen RIE, we might be able to build the bi-layer patterns for easy lift-off and fabricate nano-sized metal patterns through this lift-off process.
| Original language | English |
|---|---|
| Title of host publication | Materials Science Forum |
| Pages | 446-449 |
| Number of pages | 4 |
| Volume | 510-511 |
| Publication status | Published - 2006 Dec 1 |
| Event | 7th International Symposium on Eco-Materials Processing and Design, ISEPD-7 - Chengdu, China Duration: 2006 Jan 8 → 2006 Jan 11 |
Publication series
| Name | Materials Science Forum |
|---|---|
| Volume | 510-511 |
| ISSN (Print) | 02555476 |
Other
| Other | 7th International Symposium on Eco-Materials Processing and Design, ISEPD-7 |
|---|---|
| Country | China |
| City | Chengdu |
| Period | 06/1/8 → 06/1/11 |
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Keywords
- Bi-layer imprinting
- Lift-off
- LOL ™2000
- UV nano imprint lithography
ASJC Scopus subject areas
- Materials Science(all)
Cite this
Fabrication of nano-sized gold dot array using Bi-layer nano imprint lithography. / Yang, Ki Yeon; Hong, Sung Hoon; Lee, Heon; Choi, Jeong Woo.
Materials Science Forum. Vol. 510-511 2006. p. 446-449 (Materials Science Forum; Vol. 510-511).Research output: Chapter in Book/Report/Conference proceeding › Conference contribution
}
TY - GEN
T1 - Fabrication of nano-sized gold dot array using Bi-layer nano imprint lithography
AU - Yang, Ki Yeon
AU - Hong, Sung Hoon
AU - Lee, Heon
AU - Choi, Jeong Woo
PY - 2006/12/1
Y1 - 2006/12/1
N2 - UV nano imprint lithography (UV NIL) that uses a monomer based UV curable monomer resin is proposed as a method of imprinting at low temperature and pressure. The fabrication of high fidelity patterns on a topographical substrate is a formidable challenge. To accomplish this, the use of bi-layer nano imprint lithography, which involves the use of an easily removable under-layer and an imprinted pattern, is proposed. We hypothesized that by etching the under layer by oxygen RIE, we might be able to build the bi-layer patterns for easy lift-off and fabricate nano-sized metal patterns through this lift-off process.
AB - UV nano imprint lithography (UV NIL) that uses a monomer based UV curable monomer resin is proposed as a method of imprinting at low temperature and pressure. The fabrication of high fidelity patterns on a topographical substrate is a formidable challenge. To accomplish this, the use of bi-layer nano imprint lithography, which involves the use of an easily removable under-layer and an imprinted pattern, is proposed. We hypothesized that by etching the under layer by oxygen RIE, we might be able to build the bi-layer patterns for easy lift-off and fabricate nano-sized metal patterns through this lift-off process.
KW - Bi-layer imprinting
KW - Lift-off
KW - LOL ™2000
KW - UV nano imprint lithography
UR - http://www.scopus.com/inward/record.url?scp=35748929981&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=35748929981&partnerID=8YFLogxK
M3 - Conference contribution
AN - SCOPUS:35748929981
SN - 0878499954
SN - 9780878499953
VL - 510-511
T3 - Materials Science Forum
SP - 446
EP - 449
BT - Materials Science Forum
ER -