Fabrication of nano-sized gold dot array using Bi-layer nano imprint lithography

Ki Yeon Yang, Sung Hoon Hong, Heon Lee, Jeong Woo Choi

Research output: Chapter in Book/Report/Conference proceedingConference contribution

3 Citations (Scopus)

Abstract

UV nano imprint lithography (UV NIL) that uses a monomer based UV curable monomer resin is proposed as a method of imprinting at low temperature and pressure. The fabrication of high fidelity patterns on a topographical substrate is a formidable challenge. To accomplish this, the use of bi-layer nano imprint lithography, which involves the use of an easily removable under-layer and an imprinted pattern, is proposed. We hypothesized that by etching the under layer by oxygen RIE, we might be able to build the bi-layer patterns for easy lift-off and fabricate nano-sized metal patterns through this lift-off process.

Original languageEnglish
Title of host publicationMaterials Science Forum
Pages446-449
Number of pages4
Volume510-511
Publication statusPublished - 2006 Dec 1
Event7th International Symposium on Eco-Materials Processing and Design, ISEPD-7 - Chengdu, China
Duration: 2006 Jan 82006 Jan 11

Publication series

NameMaterials Science Forum
Volume510-511
ISSN (Print)02555476

Other

Other7th International Symposium on Eco-Materials Processing and Design, ISEPD-7
CountryChina
CityChengdu
Period06/1/806/1/11

Fingerprint

Gold
Lithography
Monomers
Fabrication
Reactive ion etching
Etching
Resins
Metals
Oxygen
Substrates
Temperature

Keywords

  • Bi-layer imprinting
  • Lift-off
  • LOL ™2000
  • UV nano imprint lithography

ASJC Scopus subject areas

  • Materials Science(all)

Cite this

Yang, K. Y., Hong, S. H., Lee, H., & Choi, J. W. (2006). Fabrication of nano-sized gold dot array using Bi-layer nano imprint lithography. In Materials Science Forum (Vol. 510-511, pp. 446-449). (Materials Science Forum; Vol. 510-511).

Fabrication of nano-sized gold dot array using Bi-layer nano imprint lithography. / Yang, Ki Yeon; Hong, Sung Hoon; Lee, Heon; Choi, Jeong Woo.

Materials Science Forum. Vol. 510-511 2006. p. 446-449 (Materials Science Forum; Vol. 510-511).

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Yang, KY, Hong, SH, Lee, H & Choi, JW 2006, Fabrication of nano-sized gold dot array using Bi-layer nano imprint lithography. in Materials Science Forum. vol. 510-511, Materials Science Forum, vol. 510-511, pp. 446-449, 7th International Symposium on Eco-Materials Processing and Design, ISEPD-7, Chengdu, China, 06/1/8.
Yang KY, Hong SH, Lee H, Choi JW. Fabrication of nano-sized gold dot array using Bi-layer nano imprint lithography. In Materials Science Forum. Vol. 510-511. 2006. p. 446-449. (Materials Science Forum).
Yang, Ki Yeon ; Hong, Sung Hoon ; Lee, Heon ; Choi, Jeong Woo. / Fabrication of nano-sized gold dot array using Bi-layer nano imprint lithography. Materials Science Forum. Vol. 510-511 2006. pp. 446-449 (Materials Science Forum).
@inproceedings{366e941f35654f579f83ae313de04dcf,
title = "Fabrication of nano-sized gold dot array using Bi-layer nano imprint lithography",
abstract = "UV nano imprint lithography (UV NIL) that uses a monomer based UV curable monomer resin is proposed as a method of imprinting at low temperature and pressure. The fabrication of high fidelity patterns on a topographical substrate is a formidable challenge. To accomplish this, the use of bi-layer nano imprint lithography, which involves the use of an easily removable under-layer and an imprinted pattern, is proposed. We hypothesized that by etching the under layer by oxygen RIE, we might be able to build the bi-layer patterns for easy lift-off and fabricate nano-sized metal patterns through this lift-off process.",
keywords = "Bi-layer imprinting, Lift-off, LOL ™2000, UV nano imprint lithography",
author = "Yang, {Ki Yeon} and Hong, {Sung Hoon} and Heon Lee and Choi, {Jeong Woo}",
year = "2006",
month = "12",
day = "1",
language = "English",
isbn = "0878499954",
volume = "510-511",
series = "Materials Science Forum",
pages = "446--449",
booktitle = "Materials Science Forum",

}

TY - GEN

T1 - Fabrication of nano-sized gold dot array using Bi-layer nano imprint lithography

AU - Yang, Ki Yeon

AU - Hong, Sung Hoon

AU - Lee, Heon

AU - Choi, Jeong Woo

PY - 2006/12/1

Y1 - 2006/12/1

N2 - UV nano imprint lithography (UV NIL) that uses a monomer based UV curable monomer resin is proposed as a method of imprinting at low temperature and pressure. The fabrication of high fidelity patterns on a topographical substrate is a formidable challenge. To accomplish this, the use of bi-layer nano imprint lithography, which involves the use of an easily removable under-layer and an imprinted pattern, is proposed. We hypothesized that by etching the under layer by oxygen RIE, we might be able to build the bi-layer patterns for easy lift-off and fabricate nano-sized metal patterns through this lift-off process.

AB - UV nano imprint lithography (UV NIL) that uses a monomer based UV curable monomer resin is proposed as a method of imprinting at low temperature and pressure. The fabrication of high fidelity patterns on a topographical substrate is a formidable challenge. To accomplish this, the use of bi-layer nano imprint lithography, which involves the use of an easily removable under-layer and an imprinted pattern, is proposed. We hypothesized that by etching the under layer by oxygen RIE, we might be able to build the bi-layer patterns for easy lift-off and fabricate nano-sized metal patterns through this lift-off process.

KW - Bi-layer imprinting

KW - Lift-off

KW - LOL ™2000

KW - UV nano imprint lithography

UR - http://www.scopus.com/inward/record.url?scp=35748929981&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=35748929981&partnerID=8YFLogxK

M3 - Conference contribution

AN - SCOPUS:35748929981

SN - 0878499954

SN - 9780878499953

VL - 510-511

T3 - Materials Science Forum

SP - 446

EP - 449

BT - Materials Science Forum

ER -