TY - GEN
T1 - Fabrication of nano-sized gold dot array using Bi-layer nano imprint lithography
AU - Yang, Ki Yeon
AU - Hong, Sung Hoon
AU - Lee, Heon
AU - Choi, Jeong Woo
N1 - Copyright:
Copyright 2020 Elsevier B.V., All rights reserved.
PY - 2006
Y1 - 2006
N2 - UV nano imprint lithography (UV NIL) that uses a monomer based UV curable monomer resin is proposed as a method of imprinting at low temperature and pressure. The fabrication of high fidelity patterns on a topographical substrate is a formidable challenge. To accomplish this, the use of bi-layer nano imprint lithography, which involves the use of an easily removable under-layer and an imprinted pattern, is proposed. We hypothesized that by etching the under layer by oxygen RIE, we might be able to build the bi-layer patterns for easy lift-off and fabricate nano-sized metal patterns through this lift-off process.
AB - UV nano imprint lithography (UV NIL) that uses a monomer based UV curable monomer resin is proposed as a method of imprinting at low temperature and pressure. The fabrication of high fidelity patterns on a topographical substrate is a formidable challenge. To accomplish this, the use of bi-layer nano imprint lithography, which involves the use of an easily removable under-layer and an imprinted pattern, is proposed. We hypothesized that by etching the under layer by oxygen RIE, we might be able to build the bi-layer patterns for easy lift-off and fabricate nano-sized metal patterns through this lift-off process.
KW - Bi-layer imprinting
KW - LOL ™2000
KW - Lift-off
KW - UV nano imprint lithography
UR - http://www.scopus.com/inward/record.url?scp=35748929981&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=35748929981&partnerID=8YFLogxK
U2 - 10.4028/0-87849-995-4.446
DO - 10.4028/0-87849-995-4.446
M3 - Conference contribution
AN - SCOPUS:35748929981
SN - 0878499954
SN - 9780878499953
T3 - Materials Science Forum
SP - 446
EP - 449
BT - Eco-Materials Processing and Design VII - Proceedings of the Conference of the 7th International Symposium on Eco-Materials Processing and Design, ISEPD-7
PB - Trans Tech Publications Ltd
T2 - 7th International Symposium on Eco-Materials Processing and Design, ISEPD-7
Y2 - 8 January 2006 through 11 January 2006
ER -