Fabrication of nano-sized gold dot array using Bi-layer nano imprint lithography

Ki Yeon Yang; Sung Hoon Hong; Heon Lee; Jeong Woo Choi

doi:10.4028/0-87849-995-4.446

Fabrication of nano-sized gold dot array using Bi-layer nano imprint lithography

Ki Yeon Yang, Sung Hoon Hong, Heon Lee, Jeong Woo Choi

Department of Materials Science and Engineering

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

3 Citations (Scopus)

Abstract

UV nano imprint lithography (UV NIL) that uses a monomer based UV curable monomer resin is proposed as a method of imprinting at low temperature and pressure. The fabrication of high fidelity patterns on a topographical substrate is a formidable challenge. To accomplish this, the use of bi-layer nano imprint lithography, which involves the use of an easily removable under-layer and an imprinted pattern, is proposed. We hypothesized that by etching the under layer by oxygen RIE, we might be able to build the bi-layer patterns for easy lift-off and fabricate nano-sized metal patterns through this lift-off process.

Original language	English
Title of host publication	Eco-Materials Processing and Design VII - Proceedings of the Conference of the 7th International Symposium on Eco-Materials Processing and Design, ISEPD-7
Publisher	Trans Tech Publications Ltd
Pages	446-449
Number of pages	4
ISBN (Print)	0878499954, 9780878499953
DOIs	https://doi.org/10.4028/0-87849-995-4.446
Publication status	Published - 2006
Event	7th International Symposium on Eco-Materials Processing and Design, ISEPD-7 - Chengdu, China Duration: 2006 Jan 8 → 2006 Jan 11

Publication series

Name	Materials Science Forum
Volume	510-511
ISSN (Print)	0255-5476
ISSN (Electronic)	1662-9752

Other

Other	7th International Symposium on Eco-Materials Processing and Design, ISEPD-7
Country	China
City	Chengdu
Period	06/1/8 → 06/1/11

Keywords

Bi-layer imprinting
LOL ™2000
Lift-off
UV nano imprint lithography

ASJC Scopus subject areas

Materials Science(all)
Condensed Matter Physics
Mechanics of Materials
Mechanical Engineering

Access to Document

10.4028/0-87849-995-4.446

Fingerprint Dive into the research topics of 'Fabrication of nano-sized gold dot array using Bi-layer nano imprint lithography'. Together they form a unique fingerprint.

Cite this

Yang, K. Y., Hong, S. H., Lee, H., & Choi, J. W. (2006). Fabrication of nano-sized gold dot array using Bi-layer nano imprint lithography. In Eco-Materials Processing and Design VII - Proceedings of the Conference of the 7th International Symposium on Eco-Materials Processing and Design, ISEPD-7 (pp. 446-449). (Materials Science Forum; Vol. 510-511). Trans Tech Publications Ltd. https://doi.org/10.4028/0-87849-995-4.446

Fabrication of nano-sized gold dot array using Bi-layer nano imprint lithography. / Yang, Ki Yeon; Hong, Sung Hoon; Lee, Heon; Choi, Jeong Woo.

Eco-Materials Processing and Design VII - Proceedings of the Conference of the 7th International Symposium on Eco-Materials Processing and Design, ISEPD-7. Trans Tech Publications Ltd, 2006. p. 446-449 (Materials Science Forum; Vol. 510-511).

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Yang, KY, Hong, SH, Lee, H & Choi, JW 2006, Fabrication of nano-sized gold dot array using Bi-layer nano imprint lithography. in Eco-Materials Processing and Design VII - Proceedings of the Conference of the 7th International Symposium on Eco-Materials Processing and Design, ISEPD-7. Materials Science Forum, vol. 510-511, Trans Tech Publications Ltd, pp. 446-449, 7th International Symposium on Eco-Materials Processing and Design, ISEPD-7, Chengdu, China, 06/1/8. https://doi.org/10.4028/0-87849-995-4.446

Yang KY, Hong SH, Lee H, Choi JW. Fabrication of nano-sized gold dot array using Bi-layer nano imprint lithography. In Eco-Materials Processing and Design VII - Proceedings of the Conference of the 7th International Symposium on Eco-Materials Processing and Design, ISEPD-7. Trans Tech Publications Ltd. 2006. p. 446-449. (Materials Science Forum). https://doi.org/10.4028/0-87849-995-4.446

Yang, Ki Yeon ; Hong, Sung Hoon ; Lee, Heon ; Choi, Jeong Woo. / Fabrication of nano-sized gold dot array using Bi-layer nano imprint lithography. Eco-Materials Processing and Design VII - Proceedings of the Conference of the 7th International Symposium on Eco-Materials Processing and Design, ISEPD-7. Trans Tech Publications Ltd, 2006. pp. 446-449 (Materials Science Forum).

@inproceedings{366e941f35654f579f83ae313de04dcf,

title = "Fabrication of nano-sized gold dot array using Bi-layer nano imprint lithography",

abstract = "UV nano imprint lithography (UV NIL) that uses a monomer based UV curable monomer resin is proposed as a method of imprinting at low temperature and pressure. The fabrication of high fidelity patterns on a topographical substrate is a formidable challenge. To accomplish this, the use of bi-layer nano imprint lithography, which involves the use of an easily removable under-layer and an imprinted pattern, is proposed. We hypothesized that by etching the under layer by oxygen RIE, we might be able to build the bi-layer patterns for easy lift-off and fabricate nano-sized metal patterns through this lift-off process.",

keywords = "Bi-layer imprinting, LOL {\texttrademark}2000, Lift-off, UV nano imprint lithography",

author = "Yang, {Ki Yeon} and Hong, {Sung Hoon} and Heon Lee and Choi, {Jeong Woo}",

year = "2006",

doi = "10.4028/0-87849-995-4.446",

language = "English",

isbn = "0878499954",

series = "Materials Science Forum",

publisher = "Trans Tech Publications Ltd",

pages = "446--449",

booktitle = "Eco-Materials Processing and Design VII - Proceedings of the Conference of the 7th International Symposium on Eco-Materials Processing and Design, ISEPD-7",

}

TY - GEN

T1 - Fabrication of nano-sized gold dot array using Bi-layer nano imprint lithography

AU - Yang, Ki Yeon

AU - Hong, Sung Hoon

AU - Lee, Heon

AU - Choi, Jeong Woo

PY - 2006

Y1 - 2006

N2 - UV nano imprint lithography (UV NIL) that uses a monomer based UV curable monomer resin is proposed as a method of imprinting at low temperature and pressure. The fabrication of high fidelity patterns on a topographical substrate is a formidable challenge. To accomplish this, the use of bi-layer nano imprint lithography, which involves the use of an easily removable under-layer and an imprinted pattern, is proposed. We hypothesized that by etching the under layer by oxygen RIE, we might be able to build the bi-layer patterns for easy lift-off and fabricate nano-sized metal patterns through this lift-off process.

AB - UV nano imprint lithography (UV NIL) that uses a monomer based UV curable monomer resin is proposed as a method of imprinting at low temperature and pressure. The fabrication of high fidelity patterns on a topographical substrate is a formidable challenge. To accomplish this, the use of bi-layer nano imprint lithography, which involves the use of an easily removable under-layer and an imprinted pattern, is proposed. We hypothesized that by etching the under layer by oxygen RIE, we might be able to build the bi-layer patterns for easy lift-off and fabricate nano-sized metal patterns through this lift-off process.

KW - Bi-layer imprinting

KW - LOL ™2000

KW - Lift-off

KW - UV nano imprint lithography

UR - http://www.scopus.com/inward/record.url?scp=35748929981&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=35748929981&partnerID=8YFLogxK

U2 - 10.4028/0-87849-995-4.446

DO - 10.4028/0-87849-995-4.446

M3 - Conference contribution

AN - SCOPUS:35748929981

SN - 0878499954

SN - 9780878499953

T3 - Materials Science Forum

SP - 446

EP - 449

BT - Eco-Materials Processing and Design VII - Proceedings of the Conference of the 7th International Symposium on Eco-Materials Processing and Design, ISEPD-7

PB - Trans Tech Publications Ltd

T2 - 7th International Symposium on Eco-Materials Processing and Design, ISEPD-7

Y2 - 8 January 2006 through 11 January 2006

ER -