Fabrication of nano-sized resist patterns on flexible plastic film using thermal curing nano-imprint lithography

Heon Lee, Sunghoon Hong, Kiyeon Yang, Kyungwoo Choi

Research output: Contribution to journalArticle

60 Citations (Scopus)

Abstract

Due to polymer's excellent flexibility, transparency, reliability and light weight, it is a good candidate material for substrate of devices including organic electronic devices, biomedical devices, and flexible displays (LCD and OLED). In order to build such devices on polymer, nano- to micron-sized patterning must be accomplished. Since polymer materials reacts with organic solvents or developer solutions which are inevitably used in photolithography and cannot bear high temperature (∼140 °C) process for photoresist baking, conventional photolithography cannot be used to polymer substrate. In this research, monomer based thermal curing imprinting lithography was used to make as small as 100 nm dense line and space patterns on flexible PET (polyethylene-terephthalate) film. Compared to hot embossing lithography, monomer based thermal curing imprint lithography uses monomer based imprint resin which consists of base monomer and thermal initiator. Since it is liquid phase at room temperature and polymerization can be initiated at 85 °C, which is much lower than glass temperature of polymer resin, the pattern transfer can be done at much lower temperature and pressure. Hence, patterns as small as 100 nm were successfully fabricated on flexible PET film substrate by monomer based thermal curing imprinting lithography at 85 °C and 5 atm without any noticeable degradation of PET substrate.

Original languageEnglish
Pages (from-to)323-327
Number of pages5
JournalMicroelectronic Engineering
Volume83
Issue number2
DOIs
Publication statusPublished - 2006 Feb 1

Fingerprint

Plastic films
polymeric films
curing
Lithography
Curing
Polymers
lithography
monomers
Monomers
Polyethylene Terephthalates
polyethylene terephthalate
Fabrication
fabrication
Polyethylene terephthalates
polymers
Photolithography
Substrates
photolithography
resins
Resins

Keywords

  • Benzyl-methacrylate monomer
  • Flexible substrate
  • Hot embossing nano-imprinting lithography
  • Monomer based imprinting lithography
  • PET (polyethylene- terephthalate) film
  • Polymerization
  • Thermal initiator
  • Transparent polymer film

ASJC Scopus subject areas

  • Hardware and Architecture
  • Electrical and Electronic Engineering
  • Electronic, Optical and Magnetic Materials
  • Surfaces, Coatings and Films
  • Atomic and Molecular Physics, and Optics

Cite this

Fabrication of nano-sized resist patterns on flexible plastic film using thermal curing nano-imprint lithography. / Lee, Heon; Hong, Sunghoon; Yang, Kiyeon; Choi, Kyungwoo.

In: Microelectronic Engineering, Vol. 83, No. 2, 01.02.2006, p. 323-327.

Research output: Contribution to journalArticle

@article{e94af8c3c81f462d8078a5384b12751a,
title = "Fabrication of nano-sized resist patterns on flexible plastic film using thermal curing nano-imprint lithography",
abstract = "Due to polymer's excellent flexibility, transparency, reliability and light weight, it is a good candidate material for substrate of devices including organic electronic devices, biomedical devices, and flexible displays (LCD and OLED). In order to build such devices on polymer, nano- to micron-sized patterning must be accomplished. Since polymer materials reacts with organic solvents or developer solutions which are inevitably used in photolithography and cannot bear high temperature (∼140 °C) process for photoresist baking, conventional photolithography cannot be used to polymer substrate. In this research, monomer based thermal curing imprinting lithography was used to make as small as 100 nm dense line and space patterns on flexible PET (polyethylene-terephthalate) film. Compared to hot embossing lithography, monomer based thermal curing imprint lithography uses monomer based imprint resin which consists of base monomer and thermal initiator. Since it is liquid phase at room temperature and polymerization can be initiated at 85 °C, which is much lower than glass temperature of polymer resin, the pattern transfer can be done at much lower temperature and pressure. Hence, patterns as small as 100 nm were successfully fabricated on flexible PET film substrate by monomer based thermal curing imprinting lithography at 85 °C and 5 atm without any noticeable degradation of PET substrate.",
keywords = "Benzyl-methacrylate monomer, Flexible substrate, Hot embossing nano-imprinting lithography, Monomer based imprinting lithography, PET (polyethylene- terephthalate) film, Polymerization, Thermal initiator, Transparent polymer film",
author = "Heon Lee and Sunghoon Hong and Kiyeon Yang and Kyungwoo Choi",
year = "2006",
month = "2",
day = "1",
doi = "10.1016/j.mee.2005.09.006",
language = "English",
volume = "83",
pages = "323--327",
journal = "Microelectronic Engineering",
issn = "0167-9317",
publisher = "Elsevier",
number = "2",

}

TY - JOUR

T1 - Fabrication of nano-sized resist patterns on flexible plastic film using thermal curing nano-imprint lithography

AU - Lee, Heon

AU - Hong, Sunghoon

AU - Yang, Kiyeon

AU - Choi, Kyungwoo

PY - 2006/2/1

Y1 - 2006/2/1

N2 - Due to polymer's excellent flexibility, transparency, reliability and light weight, it is a good candidate material for substrate of devices including organic electronic devices, biomedical devices, and flexible displays (LCD and OLED). In order to build such devices on polymer, nano- to micron-sized patterning must be accomplished. Since polymer materials reacts with organic solvents or developer solutions which are inevitably used in photolithography and cannot bear high temperature (∼140 °C) process for photoresist baking, conventional photolithography cannot be used to polymer substrate. In this research, monomer based thermal curing imprinting lithography was used to make as small as 100 nm dense line and space patterns on flexible PET (polyethylene-terephthalate) film. Compared to hot embossing lithography, monomer based thermal curing imprint lithography uses monomer based imprint resin which consists of base monomer and thermal initiator. Since it is liquid phase at room temperature and polymerization can be initiated at 85 °C, which is much lower than glass temperature of polymer resin, the pattern transfer can be done at much lower temperature and pressure. Hence, patterns as small as 100 nm were successfully fabricated on flexible PET film substrate by monomer based thermal curing imprinting lithography at 85 °C and 5 atm without any noticeable degradation of PET substrate.

AB - Due to polymer's excellent flexibility, transparency, reliability and light weight, it is a good candidate material for substrate of devices including organic electronic devices, biomedical devices, and flexible displays (LCD and OLED). In order to build such devices on polymer, nano- to micron-sized patterning must be accomplished. Since polymer materials reacts with organic solvents or developer solutions which are inevitably used in photolithography and cannot bear high temperature (∼140 °C) process for photoresist baking, conventional photolithography cannot be used to polymer substrate. In this research, monomer based thermal curing imprinting lithography was used to make as small as 100 nm dense line and space patterns on flexible PET (polyethylene-terephthalate) film. Compared to hot embossing lithography, monomer based thermal curing imprint lithography uses monomer based imprint resin which consists of base monomer and thermal initiator. Since it is liquid phase at room temperature and polymerization can be initiated at 85 °C, which is much lower than glass temperature of polymer resin, the pattern transfer can be done at much lower temperature and pressure. Hence, patterns as small as 100 nm were successfully fabricated on flexible PET film substrate by monomer based thermal curing imprinting lithography at 85 °C and 5 atm without any noticeable degradation of PET substrate.

KW - Benzyl-methacrylate monomer

KW - Flexible substrate

KW - Hot embossing nano-imprinting lithography

KW - Monomer based imprinting lithography

KW - PET (polyethylene- terephthalate) film

KW - Polymerization

KW - Thermal initiator

KW - Transparent polymer film

UR - http://www.scopus.com/inward/record.url?scp=32044434652&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=32044434652&partnerID=8YFLogxK

U2 - 10.1016/j.mee.2005.09.006

DO - 10.1016/j.mee.2005.09.006

M3 - Article

AN - SCOPUS:32044434652

VL - 83

SP - 323

EP - 327

JO - Microelectronic Engineering

JF - Microelectronic Engineering

SN - 0167-9317

IS - 2

ER -