TY - JOUR
T1 - Fabrication of nanodot arrays on Si by pulsed laser deposition using anodic aluminum oxide nanopore membrane as mask
AU - Nam, Woosung
AU - Seo, Hyejin
AU - Park, Sung Chan
AU - Bae, Chang Hyun
AU - Nam, Sang Hwan
AU - Park, Seung Min
AU - Ha, Jeong Sook
N1 - Copyright:
Copyright 2008 Elsevier B.V., All rights reserved.
PY - 2004/11
Y1 - 2004/11
N2 - We demonstrate the fabrication of metal and semiconductor nanodot arrays on Si by pulsed laser deposition using an anodic alumina membrane as a mask. A Hexagonal-close-packed nanopore membrane mask was fabricated by the anodic oxidation of aluminum sheet. Pulsed laser deposition of Ag, Ni, ZnO, and Er-doped Si (Si:Er) nanodots was performed on a Si substrate to which an alumina membrane mask adheres by van der Waals interaction. Highly ordered arrays of Ag, Ni, ZnO, and Si:Er nanodots with average diameters ranging from 55 to 86 nm and a periodicity of ∼100 nm were obtained. Also, the time-resolved images of laser-produced plasma plumes were analyzed to examine the dynamical properties of the ejected materials.
AB - We demonstrate the fabrication of metal and semiconductor nanodot arrays on Si by pulsed laser deposition using an anodic alumina membrane as a mask. A Hexagonal-close-packed nanopore membrane mask was fabricated by the anodic oxidation of aluminum sheet. Pulsed laser deposition of Ag, Ni, ZnO, and Er-doped Si (Si:Er) nanodots was performed on a Si substrate to which an alumina membrane mask adheres by van der Waals interaction. Highly ordered arrays of Ag, Ni, ZnO, and Si:Er nanodots with average diameters ranging from 55 to 86 nm and a periodicity of ∼100 nm were obtained. Also, the time-resolved images of laser-produced plasma plumes were analyzed to examine the dynamical properties of the ejected materials.
KW - Anodic aluminum oxide
KW - Nanodot array
KW - Pulsed laser deposition
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U2 - 10.1143/JJAP.43.7793
DO - 10.1143/JJAP.43.7793
M3 - Article
AN - SCOPUS:11144223714
VL - 43
SP - 7793
EP - 7797
JO - Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes
JF - Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes
SN - 0021-4922
IS - 11 A
ER -