Abstract
In this study, 300 nm thick nanoporous (np) noble metal thin films containing mesopores (2–50 nm) or macropores (> 50 nm) were fabricated by O2 plasma dealloying of sputter-deposited noble metal-carbon thin films. Noble metal-carbon thin films of 500 nm thickness were deposited on Si wafer substrates, and the target power was controlled to obtain a proper compositional ratio. Subsequently, O2 plasma dealloying was performed to selectively remove carbon atoms, thereby forming the np structure. Using this method, we successfully fabricated various np thin films of noble metals, such as Au, Ag and Pt.
| Original language | English |
|---|---|
| Pages (from-to) | 147-151 |
| Number of pages | 5 |
| Journal | Thin Solid Films |
| Volume | 631 |
| DOIs | |
| Publication status | Published - 2017 Jun 1 |
Keywords
- Dealloying
- Oxygen plasma
- Porous material
- Sputtering
- Surface diffusion
- Thin films
ASJC Scopus subject areas
- Electronic, Optical and Magnetic Materials
- Surfaces and Interfaces
- Surfaces, Coatings and Films
- Metals and Alloys
- Materials Chemistry
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Lee, G. H., An, S., Jang, S. W., Hwang, S., Lim, S. H., & Han, S. (2017). Fabrication of nanoporous noble metal thin films by O2 plasma dealloying. Thin Solid Films, 631, 147-151. https://doi.org/10.1016/j.tsf.2017.04.025