Fabrication of nanoporous noble metal thin films by O2 plasma dealloying

Geun Hyuk Lee; Sehoon An; Seong Woo Jang; Sehoon Hwang; Sang Ho Lim; Seunghee Han

doi:10.1016/j.tsf.2017.04.025

Fabrication of nanoporous noble metal thin films by O₂ plasma dealloying

Geun Hyuk Lee, Sehoon An, Seong Woo Jang, Sehoon Hwang, Sang Ho Lim, Seunghee Han

Department of Materials Science and Engineering

Research output: Contribution to journal › Article › peer-review

8 Citations (Scopus)

Abstract

In this study, 300 nm thick nanoporous (np) noble metal thin films containing mesopores (2–50 nm) or macropores (> 50 nm) were fabricated by O₂ plasma dealloying of sputter-deposited noble metal-carbon thin films. Noble metal-carbon thin films of 500 nm thickness were deposited on Si wafer substrates, and the target power was controlled to obtain a proper compositional ratio. Subsequently, O₂ plasma dealloying was performed to selectively remove carbon atoms, thereby forming the np structure. Using this method, we successfully fabricated various np thin films of noble metals, such as Au, Ag and Pt.

Original language	English
Pages (from-to)	147-151
Number of pages	5
Journal	Thin Solid Films
Volume	631
DOIs	https://doi.org/10.1016/j.tsf.2017.04.025
Publication status	Published - 2017 Jun 1

Keywords

Dealloying
Oxygen plasma
Porous material
Sputtering
Surface diffusion
Thin films

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials
Surfaces and Interfaces
Surfaces, Coatings and Films
Metals and Alloys
Materials Chemistry

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title = "Fabrication of nanoporous noble metal thin films by O2 plasma dealloying",

abstract = "In this study, 300 nm thick nanoporous (np) noble metal thin films containing mesopores (2–50 nm) or macropores (> 50 nm) were fabricated by O2 plasma dealloying of sputter-deposited noble metal-carbon thin films. Noble metal-carbon thin films of 500 nm thickness were deposited on Si wafer substrates, and the target power was controlled to obtain a proper compositional ratio. Subsequently, O2 plasma dealloying was performed to selectively remove carbon atoms, thereby forming the np structure. Using this method, we successfully fabricated various np thin films of noble metals, such as Au, Ag and Pt.",

keywords = "Dealloying, Oxygen plasma, Porous material, Sputtering, Surface diffusion, Thin films",

author = "Lee, {Geun Hyuk} and Sehoon An and Jang, {Seong Woo} and Sehoon Hwang and Lim, {Sang Ho} and Seunghee Han",

note = "Funding Information: This research was supported by the ?Advanced architecturing for high-power photovoltaics (code no. 2E26510)? and ?Development of high voltage pulse modulator for plasma immersion ion implantation (code no. 2MP0350)? programs of the Korea Institute of Science and Technology in the Republic of Korea. Publisher Copyright: {\textcopyright} 2017 Elsevier B.V. Copyright: Copyright 2017 Elsevier B.V., All rights reserved.",

year = "2017",

month = jun,

day = "1",

doi = "10.1016/j.tsf.2017.04.025",

language = "English",

volume = "631",

pages = "147--151",

journal = "Thin Solid Films",

issn = "0040-6090",

publisher = "Elsevier",

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T1 - Fabrication of nanoporous noble metal thin films by O2 plasma dealloying

AU - Lee, Geun Hyuk

AU - An, Sehoon

AU - Jang, Seong Woo

AU - Hwang, Sehoon

AU - Lim, Sang Ho

AU - Han, Seunghee

N1 - Funding Information: This research was supported by the ?Advanced architecturing for high-power photovoltaics (code no. 2E26510)? and ?Development of high voltage pulse modulator for plasma immersion ion implantation (code no. 2MP0350)? programs of the Korea Institute of Science and Technology in the Republic of Korea. Publisher Copyright: © 2017 Elsevier B.V. Copyright: Copyright 2017 Elsevier B.V., All rights reserved.

PY - 2017/6/1

Y1 - 2017/6/1

N2 - In this study, 300 nm thick nanoporous (np) noble metal thin films containing mesopores (2–50 nm) or macropores (> 50 nm) were fabricated by O2 plasma dealloying of sputter-deposited noble metal-carbon thin films. Noble metal-carbon thin films of 500 nm thickness were deposited on Si wafer substrates, and the target power was controlled to obtain a proper compositional ratio. Subsequently, O2 plasma dealloying was performed to selectively remove carbon atoms, thereby forming the np structure. Using this method, we successfully fabricated various np thin films of noble metals, such as Au, Ag and Pt.

AB - In this study, 300 nm thick nanoporous (np) noble metal thin films containing mesopores (2–50 nm) or macropores (> 50 nm) were fabricated by O2 plasma dealloying of sputter-deposited noble metal-carbon thin films. Noble metal-carbon thin films of 500 nm thickness were deposited on Si wafer substrates, and the target power was controlled to obtain a proper compositional ratio. Subsequently, O2 plasma dealloying was performed to selectively remove carbon atoms, thereby forming the np structure. Using this method, we successfully fabricated various np thin films of noble metals, such as Au, Ag and Pt.

KW - Dealloying

KW - Oxygen plasma

KW - Porous material

KW - Sputtering

KW - Surface diffusion

KW - Thin films

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