Fabrication of nanosized antireflection patterns on surface of aspheric lens substrate by nanoimprint lithography

Ju Hyeon Shin, Hak Jong Choi, Guy Tae Kim, Je Hong Choi, Heon Lee

Research output: Contribution to journalArticle

18 Citations (Scopus)


Currently, various techniques are being explored for fabricating nano- or microsized patterns on flat and curved substrates. However, there are only a few techniques that can be used to fabricate nano- to microsized patterns on the surface of aspheric lenses. In this study, nanoimprint lithography (NIL) was used to obtain nanosized antireflection structures on the surface of aspheric lenses. In order to ensure conformal contact between the imprint mould and the aspheric lens substrate, a highly flexible poly(urethane acrylate) (PUA)-based film mould was used. As a result, various nanosized patterns were uniformly fabricated on the surface of the aspheric lens with high fidelity.

Original languageEnglish
Article number055001
JournalApplied Physics Express
Issue number5
Publication statusPublished - 2013 May 1


ASJC Scopus subject areas

  • Engineering(all)
  • Physics and Astronomy(all)

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