Fabrication of oxidation-free contacts to nanopatterned Permalloy structures

Hye Young Kim, Kang Ho Lee, Gyu-Tae Kim, Woun Kang, Kyoung Jin Lee

Research output: Contribution to journalArticle

Abstract

A simple way to avoid the oxidation layer on the surface of Permalloy by improving the fabrication process was investigated. Electron-beam lithography (EBL) was used to define patterns with a very high resolution positive tone resist, ZEP 520A-7 for high dry-etch resistance, on a prepatterned silicon substrate including contact pads. Reactive ion etching (RIE) was carried out at 50 mTorr vacuum with a 100 W rf power and 50 SCCM of CH4 gas flow rate for 100s. A Piranha etch is required to remove the residual resist because the degenerated resist is not easy to remove with a solvent after the RIE process. A 4:1 mixture of sulfuric acid (H2SO4) and hydrogen peroxide (H2O2) was prepared at 110 °C. With an optimal alignment on the predefined grooves, the gold electrodes could be selectively deposited by the liftoff process with a controlled height or width. The results show that embedded structure of the electrodes minimizes the perturbation to the magnetic metallic channel with a good electrical contact.

Original languageEnglish
Pages (from-to)2487-2489
Number of pages3
JournalJournal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Volume27
Issue number6
DOIs
Publication statusPublished - 2009 Dec 1

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ASJC Scopus subject areas

  • Condensed Matter Physics
  • Electrical and Electronic Engineering

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