Fabrication of roll imprint stamp for continuous UV roll imprinting process

Seon Yong Hwang, Sung Hoon Hong, Ho Yong Jung, Heon Lee

Research output: Contribution to journalArticle

27 Citations (Scopus)

Abstract

Recently, nano imprint lithography has been developed for mass production of nano-scale patterns on large-scale substrates. To achieve high throughput and cost reduction, roll-to-roll imprint lithography has been introduced. The roll-to-roll imprint is the suitable process for large area patterning, especially, flexible substrates for display devices. In this study, roll-to-roll imprint stamp is fabricated using poly-vinyl alcohol (PVA) mold and UV curable poly-dimethylsiloxanes (PDMS) resin for continuous roll imprinting process. The PVA mold was chosen since it is flexible and can be dissolved in water. Since the PDMS can form thin SiOx layer on the surface by oxygen plasma treatment, silane based hydrophobic anti-stiction layer can be formed directly on the surface of PDMS. As a result, nano-sized patterns were successfully formed on the flexible PET films by UV roll imprinting with the fabricated roll stamp.

Original languageEnglish
Pages (from-to)642-645
Number of pages4
JournalMicroelectronic Engineering
Volume86
Issue number4-6
DOIs
Publication statusPublished - 2009 Apr 1

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Keywords

  • M-PDMS (Methacryloxypropyl terminated poly-dimethylsiloxanes)
  • Nano imprint lithography
  • PVA (poly-vinyl alcohol)
  • Roll stamp
  • Roll-to-Roll imprint

ASJC Scopus subject areas

  • Electrical and Electronic Engineering
  • Electronic, Optical and Magnetic Materials
  • Surfaces, Coatings and Films
  • Atomic and Molecular Physics, and Optics
  • Condensed Matter Physics

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