Abstract
Recently, nanoimprint lithography (NIL) has been extensively investigated as a cost-effective, high-throughput, nano-patterning method, especially for the fabrication of optical devices such as light emitting diodes and thin film solar cells. Thermal nanoimprint lithography (thermal-NIL), one of various methods of NIL, can be applied with relative ease for the fabrication of various nanoscale structures, even on flexible substrates. However, conventional thermal-NIL that uses polymeric resin such as Poly(methyl methacrylate) has limited applicability to the fabrication of optical devices, owing to the low refractive index of the resin. As such, we developed SnO2-nanoparticle-containing imprint resin that has a high refractive index and is applicable in the thermal-NIL method. We confirmed that various SnO2 nano-to-microscale structures were successfully fabricated via the thermal-NIL process, by using this SnO2-dispersed resin. The optical properties of the patterned SnO2 structures were analyzed via ultraviolet-visible spectrophotometry and crystallinity of these patterned SnO2 structures was determined via X-ray diffraction analysis.
| Original language | English |
|---|---|
| Pages (from-to) | 11308-11312 |
| Number of pages | 5 |
| Journal | Journal of Nanoscience and Nanotechnology |
| Volume | 16 |
| Issue number | 11 |
| DOIs | |
| Publication status | Published - 2016 |
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Keywords
- Direct patterning
- Nano-to-microscale structure
- SnO nanoparticle
- Thermal-imprint lithography
ASJC Scopus subject areas
- Bioengineering
- Chemistry(all)
- Biomedical Engineering
- Materials Science(all)
- Condensed Matter Physics
Cite this
Fabrication of SnO2 nano-to-microscale structures from SnO2-nanoparticle-dispersed resin via thermal nanoimprint lithography. / Jun, Junho; Choi, Hak Jong; Moon, Sungjin; Sung, Young Hoon; Lee, Heon.
In: Journal of Nanoscience and Nanotechnology, Vol. 16, No. 11, 2016, p. 11308-11312.Research output: Contribution to journal › Article
}
TY - JOUR
T1 - Fabrication of SnO2 nano-to-microscale structures from SnO2-nanoparticle-dispersed resin via thermal nanoimprint lithography
AU - Jun, Junho
AU - Choi, Hak Jong
AU - Moon, Sungjin
AU - Sung, Young Hoon
AU - Lee, Heon
PY - 2016
Y1 - 2016
N2 - Recently, nanoimprint lithography (NIL) has been extensively investigated as a cost-effective, high-throughput, nano-patterning method, especially for the fabrication of optical devices such as light emitting diodes and thin film solar cells. Thermal nanoimprint lithography (thermal-NIL), one of various methods of NIL, can be applied with relative ease for the fabrication of various nanoscale structures, even on flexible substrates. However, conventional thermal-NIL that uses polymeric resin such as Poly(methyl methacrylate) has limited applicability to the fabrication of optical devices, owing to the low refractive index of the resin. As such, we developed SnO2-nanoparticle-containing imprint resin that has a high refractive index and is applicable in the thermal-NIL method. We confirmed that various SnO2 nano-to-microscale structures were successfully fabricated via the thermal-NIL process, by using this SnO2-dispersed resin. The optical properties of the patterned SnO2 structures were analyzed via ultraviolet-visible spectrophotometry and crystallinity of these patterned SnO2 structures was determined via X-ray diffraction analysis.
AB - Recently, nanoimprint lithography (NIL) has been extensively investigated as a cost-effective, high-throughput, nano-patterning method, especially for the fabrication of optical devices such as light emitting diodes and thin film solar cells. Thermal nanoimprint lithography (thermal-NIL), one of various methods of NIL, can be applied with relative ease for the fabrication of various nanoscale structures, even on flexible substrates. However, conventional thermal-NIL that uses polymeric resin such as Poly(methyl methacrylate) has limited applicability to the fabrication of optical devices, owing to the low refractive index of the resin. As such, we developed SnO2-nanoparticle-containing imprint resin that has a high refractive index and is applicable in the thermal-NIL method. We confirmed that various SnO2 nano-to-microscale structures were successfully fabricated via the thermal-NIL process, by using this SnO2-dispersed resin. The optical properties of the patterned SnO2 structures were analyzed via ultraviolet-visible spectrophotometry and crystallinity of these patterned SnO2 structures was determined via X-ray diffraction analysis.
KW - Direct patterning
KW - Nano-to-microscale structure
KW - SnO nanoparticle
KW - Thermal-imprint lithography
UR - http://www.scopus.com/inward/record.url?scp=84992381888&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=84992381888&partnerID=8YFLogxK
U2 - 10.1166/jnn.2016.13499
DO - 10.1166/jnn.2016.13499
M3 - Article
AN - SCOPUS:84992381888
VL - 16
SP - 11308
EP - 11312
JO - Journal of Nanoscience and Nanotechnology
JF - Journal of Nanoscience and Nanotechnology
SN - 1533-4880
IS - 11
ER -