Fabrication of sub-100 nm sized patterns on curved acryl substrate using a flexible stamp

Sung Hoon Hong, Kang Soo Han, Kyeong Jae Byeon, Heon Lee, Kyung Woo Choi

Research output: Contribution to journalArticle

20 Citations (Scopus)

Abstract

As small as 100 nm patterns were successfully transferred onto a non-planar acryl substrate using both UV nanoimprinting and hot embossing techniques. Two different types of flexible imprint stamps, electroformed nickel foil stamp and molded water-soluble poly(vinyl alcohol) (PVA) stamp, were used. 100 nm line and space pattern of Si master was successfully transferred to nickel foil stamp and PVA stamp and their patterns were also transferred to the surface of curved acryl substrate using either UV nanoimprint lithography or hot embossing lithography.

Original languageEnglish
Pages (from-to)3699-3701
Number of pages3
JournalJapanese Journal of Applied Physics
Volume47
Issue number5 PART 1
DOIs
Publication statusPublished - 2008 May 16

Fingerprint

Metal foil
embossing
Nickel
Nanoimprint lithography
Fabrication
fabrication
foils
Substrates
lithography
nickel
Lithography
Alcohols
alcohols
Water
water

Keywords

  • Curved substrate
  • Flexible stamp
  • Hot embossing
  • Nanoimprint
  • Nickel foil stamp

ASJC Scopus subject areas

  • Engineering(all)
  • Physics and Astronomy(all)

Cite this

Fabrication of sub-100 nm sized patterns on curved acryl substrate using a flexible stamp. / Hong, Sung Hoon; Han, Kang Soo; Byeon, Kyeong Jae; Lee, Heon; Choi, Kyung Woo.

In: Japanese Journal of Applied Physics, Vol. 47, No. 5 PART 1, 16.05.2008, p. 3699-3701.

Research output: Contribution to journalArticle

Hong, Sung Hoon ; Han, Kang Soo ; Byeon, Kyeong Jae ; Lee, Heon ; Choi, Kyung Woo. / Fabrication of sub-100 nm sized patterns on curved acryl substrate using a flexible stamp. In: Japanese Journal of Applied Physics. 2008 ; Vol. 47, No. 5 PART 1. pp. 3699-3701.
@article{5622431f84ec440b923e7beac2c02a78,
title = "Fabrication of sub-100 nm sized patterns on curved acryl substrate using a flexible stamp",
abstract = "As small as 100 nm patterns were successfully transferred onto a non-planar acryl substrate using both UV nanoimprinting and hot embossing techniques. Two different types of flexible imprint stamps, electroformed nickel foil stamp and molded water-soluble poly(vinyl alcohol) (PVA) stamp, were used. 100 nm line and space pattern of Si master was successfully transferred to nickel foil stamp and PVA stamp and their patterns were also transferred to the surface of curved acryl substrate using either UV nanoimprint lithography or hot embossing lithography.",
keywords = "Curved substrate, Flexible stamp, Hot embossing, Nanoimprint, Nickel foil stamp",
author = "Hong, {Sung Hoon} and Han, {Kang Soo} and Byeon, {Kyeong Jae} and Heon Lee and Choi, {Kyung Woo}",
year = "2008",
month = "5",
day = "16",
doi = "10.1143/JJAP.47.3699",
language = "English",
volume = "47",
pages = "3699--3701",
journal = "Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes",
issn = "0021-4922",
publisher = "Japan Society of Applied Physics",
number = "5 PART 1",

}

TY - JOUR

T1 - Fabrication of sub-100 nm sized patterns on curved acryl substrate using a flexible stamp

AU - Hong, Sung Hoon

AU - Han, Kang Soo

AU - Byeon, Kyeong Jae

AU - Lee, Heon

AU - Choi, Kyung Woo

PY - 2008/5/16

Y1 - 2008/5/16

N2 - As small as 100 nm patterns were successfully transferred onto a non-planar acryl substrate using both UV nanoimprinting and hot embossing techniques. Two different types of flexible imprint stamps, electroformed nickel foil stamp and molded water-soluble poly(vinyl alcohol) (PVA) stamp, were used. 100 nm line and space pattern of Si master was successfully transferred to nickel foil stamp and PVA stamp and their patterns were also transferred to the surface of curved acryl substrate using either UV nanoimprint lithography or hot embossing lithography.

AB - As small as 100 nm patterns were successfully transferred onto a non-planar acryl substrate using both UV nanoimprinting and hot embossing techniques. Two different types of flexible imprint stamps, electroformed nickel foil stamp and molded water-soluble poly(vinyl alcohol) (PVA) stamp, were used. 100 nm line and space pattern of Si master was successfully transferred to nickel foil stamp and PVA stamp and their patterns were also transferred to the surface of curved acryl substrate using either UV nanoimprint lithography or hot embossing lithography.

KW - Curved substrate

KW - Flexible stamp

KW - Hot embossing

KW - Nanoimprint

KW - Nickel foil stamp

UR - http://www.scopus.com/inward/record.url?scp=55049128077&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=55049128077&partnerID=8YFLogxK

U2 - 10.1143/JJAP.47.3699

DO - 10.1143/JJAP.47.3699

M3 - Article

AN - SCOPUS:55049128077

VL - 47

SP - 3699

EP - 3701

JO - Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes

JF - Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes

SN - 0021-4922

IS - 5 PART 1

ER -