Fabrication of sub-100 nm sized patterns on curved acryl substrate using a flexible stamp

Sung Hoon Hong, Kang Soo Han, Kyeong Jae Byeon, Heon Lee, Kyung Woo Choi

Research output: Contribution to journalArticle

20 Citations (Scopus)


As small as 100 nm patterns were successfully transferred onto a non-planar acryl substrate using both UV nanoimprinting and hot embossing techniques. Two different types of flexible imprint stamps, electroformed nickel foil stamp and molded water-soluble poly(vinyl alcohol) (PVA) stamp, were used. 100 nm line and space pattern of Si master was successfully transferred to nickel foil stamp and PVA stamp and their patterns were also transferred to the surface of curved acryl substrate using either UV nanoimprint lithography or hot embossing lithography.

Original languageEnglish
Pages (from-to)3699-3701
Number of pages3
JournalJapanese Journal of Applied Physics
Issue number5 PART 1
Publication statusPublished - 2008 May 16



  • Curved substrate
  • Flexible stamp
  • Hot embossing
  • Nanoimprint
  • Nickel foil stamp

ASJC Scopus subject areas

  • Engineering(all)
  • Physics and Astronomy(all)

Cite this