Fabrication of submicron metallic grids with interference and phase-mask holography

Joong Mok Park; Tae Geun Kim; Kristen Constant; Kai Ming Ho

doi:10.1117/1.3541794

Fabrication of submicron metallic grids with interference and phase-mask holography

Joong Mok Park, Tae Geun Kim, Kristen Constant, Kai Ming Ho

School of Electrical Engineering

Research output: Contribution to journal › Article

7 Citations (Scopus)

Abstract

Complex, submicron Cu metallic mesh nanostructures are made by electrochemical deposition using polymer templates made from photoresist. The polymer templates are fabricated with photoresist using two-beam interference holography and phase mask holography with three diffracted beams. Freestanding metallic mesh structures are made in two separate electrodepositions with perpendicular photoresist grating templates. Cu mesh square nanostructures having large (52.6) open areas are also made by single electrodeposition with a photoresist template made with a phase mask. These structures have potential as electrodes in photonic devices.

Original language	English
Article number	013011
Journal	Journal of Micro/ Nanolithography, MEMS, and MOEMS
Volume	10
Issue number	1
DOIs	https://doi.org/10.1117/1.3541794
Publication status	Published - 2011 Jan 1

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Keywords

complex nanostructures
fabrication and characterization nanoscale materials
holographic interferometry
methods of micro- and nanofabrication
photonic bandgap materials

ASJC Scopus subject areas

Electrical and Electronic Engineering
Mechanical Engineering
Electronic, Optical and Magnetic Materials
Condensed Matter Physics
Atomic and Molecular Physics, and Optics

Cite this

Park, J. M., Kim, T. G., Constant, K., & Ho, K. M. (2011). Fabrication of submicron metallic grids with interference and phase-mask holography. Journal of Micro/ Nanolithography, MEMS, and MOEMS, 10(1), [013011]. https://doi.org/10.1117/1.3541794

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10.1117/1.3541794