Abstract
Complex, submicron Cu metallic mesh nanostructures are made by electrochemical deposition using polymer templates made from photoresist. The polymer templates are fabricated with photoresist using two-beam interference holography and phase mask holography with three diffracted beams. Freestanding metallic mesh structures are made in two separate electrodepositions with perpendicular photoresist grating templates. Cu mesh square nanostructures having large (52.6) open areas are also made by single electrodeposition with a photoresist template made with a phase mask. These structures have potential as electrodes in photonic devices.
| Original language | English |
|---|---|
| Article number | 013011 |
| Journal | Journal of Micro/ Nanolithography, MEMS, and MOEMS |
| Volume | 10 |
| Issue number | 1 |
| DOIs | |
| Publication status | Published - 2011 Jan 1 |
Fingerprint
Keywords
- complex nanostructures
- fabrication and characterization nanoscale materials
- holographic interferometry
- methods of micro- and nanofabrication
- photonic bandgap materials
ASJC Scopus subject areas
- Electrical and Electronic Engineering
- Mechanical Engineering
- Electronic, Optical and Magnetic Materials
- Condensed Matter Physics
- Atomic and Molecular Physics, and Optics
Cite this
Fabrication of submicron metallic grids with interference and phase-mask holography. / Park, Joong Mok; Kim, Tae Geun; Constant, Kristen; Ho, Kai Ming.
In: Journal of Micro/ Nanolithography, MEMS, and MOEMS, Vol. 10, No. 1, 013011, 01.01.2011.Research output: Contribution to journal › Article
}
TY - JOUR
T1 - Fabrication of submicron metallic grids with interference and phase-mask holography
AU - Park, Joong Mok
AU - Kim, Tae Geun
AU - Constant, Kristen
AU - Ho, Kai Ming
PY - 2011/1/1
Y1 - 2011/1/1
N2 - Complex, submicron Cu metallic mesh nanostructures are made by electrochemical deposition using polymer templates made from photoresist. The polymer templates are fabricated with photoresist using two-beam interference holography and phase mask holography with three diffracted beams. Freestanding metallic mesh structures are made in two separate electrodepositions with perpendicular photoresist grating templates. Cu mesh square nanostructures having large (52.6) open areas are also made by single electrodeposition with a photoresist template made with a phase mask. These structures have potential as electrodes in photonic devices.
AB - Complex, submicron Cu metallic mesh nanostructures are made by electrochemical deposition using polymer templates made from photoresist. The polymer templates are fabricated with photoresist using two-beam interference holography and phase mask holography with three diffracted beams. Freestanding metallic mesh structures are made in two separate electrodepositions with perpendicular photoresist grating templates. Cu mesh square nanostructures having large (52.6) open areas are also made by single electrodeposition with a photoresist template made with a phase mask. These structures have potential as electrodes in photonic devices.
KW - complex nanostructures
KW - fabrication and characterization nanoscale materials
KW - holographic interferometry
KW - methods of micro- and nanofabrication
KW - photonic bandgap materials
UR - http://www.scopus.com/inward/record.url?scp=79551633866&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=79551633866&partnerID=8YFLogxK
U2 - 10.1117/1.3541794
DO - 10.1117/1.3541794
M3 - Article
AN - SCOPUS:79551633866
VL - 10
JO - Journal of Micro/ Nanolithography, MEMS, and MOEMS
JF - Journal of Micro/ Nanolithography, MEMS, and MOEMS
SN - 1932-5150
IS - 1
M1 - 013011
ER -