TY - JOUR
T1 - Fabrication of submicron metallic grids with interference and phase-mask holography
AU - Park, Joong Mok
AU - Kim, Tae Geun
AU - Constant, Kristen
AU - Ho, Kai Ming
N1 - Funding Information:
This work is supported by the Division of Materials Sciences and Engineering, Basic Energy Sciences, U.S. Department of Energy. The Ames Laboratory is operated by Iowa State University for the Office of Science, U.S. Department of Energy under Contract No. DE-AC0207-CH11358. This work also was supported by a Korea Research Foundation grant funded by the Korean Government (MOEHRD) (Grant No. KRF-2008-D00074) and partly supported by a Korea Science and Engineering Foundation (KOSEF) grant funded by the Korea government (MOST) under Project No. F012007-00011760-0.
PY - 2011
Y1 - 2011
N2 - Complex, submicron Cu metallic mesh nanostructures are made by electrochemical deposition using polymer templates made from photoresist. The polymer templates are fabricated with photoresist using two-beam interference holography and phase mask holography with three diffracted beams. Freestanding metallic mesh structures are made in two separate electrodepositions with perpendicular photoresist grating templates. Cu mesh square nanostructures having large (52.6) open areas are also made by single electrodeposition with a photoresist template made with a phase mask. These structures have potential as electrodes in photonic devices.
AB - Complex, submicron Cu metallic mesh nanostructures are made by electrochemical deposition using polymer templates made from photoresist. The polymer templates are fabricated with photoresist using two-beam interference holography and phase mask holography with three diffracted beams. Freestanding metallic mesh structures are made in two separate electrodepositions with perpendicular photoresist grating templates. Cu mesh square nanostructures having large (52.6) open areas are also made by single electrodeposition with a photoresist template made with a phase mask. These structures have potential as electrodes in photonic devices.
KW - complex nanostructures
KW - fabrication and characterization nanoscale materials
KW - holographic interferometry
KW - methods of micro- and nanofabrication
KW - photonic bandgap materials
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U2 - 10.1117/1.3541794
DO - 10.1117/1.3541794
M3 - Article
AN - SCOPUS:79551633866
VL - 10
JO - Journal of Micro/ Nanolithography, MEMS, and MOEMS
JF - Journal of Micro/ Nanolithography, MEMS, and MOEMS
SN - 1932-5150
IS - 1
M1 - 013011
ER -