Fabrication of submicron metallic grids with interference and phase-mask holography

Joong Mok Park, Tae Geun Kim, Kristen Constant, Kai Ming Ho

Research output: Contribution to journalArticlepeer-review

7 Citations (Scopus)


Complex, submicron Cu metallic mesh nanostructures are made by electrochemical deposition using polymer templates made from photoresist. The polymer templates are fabricated with photoresist using two-beam interference holography and phase mask holography with three diffracted beams. Freestanding metallic mesh structures are made in two separate electrodepositions with perpendicular photoresist grating templates. Cu mesh square nanostructures having large (52.6) open areas are also made by single electrodeposition with a photoresist template made with a phase mask. These structures have potential as electrodes in photonic devices.

Original languageEnglish
Article number013011
JournalJournal of Micro/Nanolithography, MEMS, and MOEMS
Issue number1
Publication statusPublished - 2011


  • complex nanostructures
  • fabrication and characterization nanoscale materials
  • holographic interferometry
  • methods of micro- and nanofabrication
  • photonic bandgap materials

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Atomic and Molecular Physics, and Optics
  • Condensed Matter Physics
  • Mechanical Engineering
  • Electrical and Electronic Engineering


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