Fabrication of submicron metallic grids with interference and phase-mask holography

Joong Mok Park, Tae Geun Kim, Kristen Constant, Kai Ming Ho

Research output: Contribution to journalArticle

7 Citations (Scopus)

Abstract

Complex, submicron Cu metallic mesh nanostructures are made by electrochemical deposition using polymer templates made from photoresist. The polymer templates are fabricated with photoresist using two-beam interference holography and phase mask holography with three diffracted beams. Freestanding metallic mesh structures are made in two separate electrodepositions with perpendicular photoresist grating templates. Cu mesh square nanostructures having large (52.6) open areas are also made by single electrodeposition with a photoresist template made with a phase mask. These structures have potential as electrodes in photonic devices.

Original languageEnglish
Article number013011
JournalJournal of Micro/ Nanolithography, MEMS, and MOEMS
Volume10
Issue number1
DOIs
Publication statusPublished - 2011 Jan 1

Fingerprint

Holography
Photoresists
photoresists
holography
Masks
masks
templates
grids
interference
Fabrication
mesh
fabrication
Electrodeposition
electrodeposition
Nanostructures
Polymers
Photonic devices
polymers
gratings
photonics

Keywords

  • complex nanostructures
  • fabrication and characterization nanoscale materials
  • holographic interferometry
  • methods of micro- and nanofabrication
  • photonic bandgap materials

ASJC Scopus subject areas

  • Electrical and Electronic Engineering
  • Mechanical Engineering
  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Atomic and Molecular Physics, and Optics

Cite this

Fabrication of submicron metallic grids with interference and phase-mask holography. / Park, Joong Mok; Kim, Tae Geun; Constant, Kristen; Ho, Kai Ming.

In: Journal of Micro/ Nanolithography, MEMS, and MOEMS, Vol. 10, No. 1, 013011, 01.01.2011.

Research output: Contribution to journalArticle

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