Abstract
Complex, submicron Cu metallic mesh nanostructures are made by electrochemical deposition using polymer templates made from photoresist. The polymer templates are fabricated with photoresist using two-beam interference holography and phase mask holography with three diffracted beams. Freestanding metallic mesh structures are made in two separate electrodepositions with perpendicular photoresist grating templates. Cu mesh square nanostructures having large (52.6) open areas are also made by single electrodeposition with a photoresist template made with a phase mask. These structures have potential as electrodes in photonic devices.
| Original language | English |
|---|---|
| Article number | 013011 |
| Journal | Journal of Micro/Nanolithography, MEMS, and MOEMS |
| Volume | 10 |
| Issue number | 1 |
| DOIs | |
| Publication status | Published - 2011 |
Keywords
- complex nanostructures
- fabrication and characterization nanoscale materials
- holographic interferometry
- methods of micro- and nanofabrication
- photonic bandgap materials
ASJC Scopus subject areas
- Electronic, Optical and Magnetic Materials
- Atomic and Molecular Physics, and Optics
- Condensed Matter Physics
- Mechanical Engineering
- Electrical and Electronic Engineering
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Park, J. M., Kim, T. G., Constant, K., & Ho, K. M. (2011). Fabrication of submicron metallic grids with interference and phase-mask holography. Journal of Micro/Nanolithography, MEMS, and MOEMS, 10(1), [013011]. https://doi.org/10.1117/1.3541794