Fabrication of submicron metallic grids with interference and phase-mask holography

Joong Mok Park; Tae Geun Kim; Kristen Constant; Kai Ming Ho

doi:10.1117/1.3541794

Fabrication of submicron metallic grids with interference and phase-mask holography

Joong Mok Park, Tae Geun Kim, Kristen Constant, Kai Ming Ho

School of Electrical Engineering

Research output: Contribution to journal › Article › peer-review

7 Citations (Scopus)

Abstract

Complex, submicron Cu metallic mesh nanostructures are made by electrochemical deposition using polymer templates made from photoresist. The polymer templates are fabricated with photoresist using two-beam interference holography and phase mask holography with three diffracted beams. Freestanding metallic mesh structures are made in two separate electrodepositions with perpendicular photoresist grating templates. Cu mesh square nanostructures having large (52.6) open areas are also made by single electrodeposition with a photoresist template made with a phase mask. These structures have potential as electrodes in photonic devices.

Original language	English
Article number	013011
Journal	Journal of Micro/Nanolithography, MEMS, and MOEMS
Volume	10
Issue number	1
DOIs	https://doi.org/10.1117/1.3541794
Publication status	Published - 2011

Keywords

complex nanostructures
fabrication and characterization nanoscale materials
holographic interferometry
methods of micro- and nanofabrication
photonic bandgap materials

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials
Atomic and Molecular Physics, and Optics
Condensed Matter Physics
Mechanical Engineering
Electrical and Electronic Engineering

Access to Document

10.1117/1.3541794

Fingerprint Dive into the research topics of 'Fabrication of submicron metallic grids with interference and phase-mask holography'. Together they form a unique fingerprint.

Cite this

@article{7caf6b5a9af84771854e7a94134b327f,

title = "Fabrication of submicron metallic grids with interference and phase-mask holography",

abstract = "Complex, submicron Cu metallic mesh nanostructures are made by electrochemical deposition using polymer templates made from photoresist. The polymer templates are fabricated with photoresist using two-beam interference holography and phase mask holography with three diffracted beams. Freestanding metallic mesh structures are made in two separate electrodepositions with perpendicular photoresist grating templates. Cu mesh square nanostructures having large (52.6) open areas are also made by single electrodeposition with a photoresist template made with a phase mask. These structures have potential as electrodes in photonic devices.",

keywords = "complex nanostructures, fabrication and characterization nanoscale materials, holographic interferometry, methods of micro- and nanofabrication, photonic bandgap materials",

author = "Park, {Joong Mok} and Kim, {Tae Geun} and Kristen Constant and Ho, {Kai Ming}",

note = "Funding Information: This work is supported by the Division of Materials Sciences and Engineering, Basic Energy Sciences, U.S. Department of Energy. The Ames Laboratory is operated by Iowa State University for the Office of Science, U.S. Department of Energy under Contract No. DE-AC0207-CH11358. This work also was supported by a Korea Research Foundation grant funded by the Korean Government (MOEHRD) (Grant No. KRF-2008-D00074) and partly supported by a Korea Science and Engineering Foundation (KOSEF) grant funded by the Korea government (MOST) under Project No. F012007-00011760-0.",

year = "2011",

doi = "10.1117/1.3541794",

language = "English",

volume = "10",

journal = "Journal of Micro/ Nanolithography, MEMS, and MOEMS",

issn = "1932-5150",

publisher = "SPIE",

number = "1",

}

TY - JOUR

T1 - Fabrication of submicron metallic grids with interference and phase-mask holography

AU - Park, Joong Mok

AU - Kim, Tae Geun

AU - Constant, Kristen

AU - Ho, Kai Ming

N1 - Funding Information: This work is supported by the Division of Materials Sciences and Engineering, Basic Energy Sciences, U.S. Department of Energy. The Ames Laboratory is operated by Iowa State University for the Office of Science, U.S. Department of Energy under Contract No. DE-AC0207-CH11358. This work also was supported by a Korea Research Foundation grant funded by the Korean Government (MOEHRD) (Grant No. KRF-2008-D00074) and partly supported by a Korea Science and Engineering Foundation (KOSEF) grant funded by the Korea government (MOST) under Project No. F012007-00011760-0.

PY - 2011

Y1 - 2011

N2 - Complex, submicron Cu metallic mesh nanostructures are made by electrochemical deposition using polymer templates made from photoresist. The polymer templates are fabricated with photoresist using two-beam interference holography and phase mask holography with three diffracted beams. Freestanding metallic mesh structures are made in two separate electrodepositions with perpendicular photoresist grating templates. Cu mesh square nanostructures having large (52.6) open areas are also made by single electrodeposition with a photoresist template made with a phase mask. These structures have potential as electrodes in photonic devices.

AB - Complex, submicron Cu metallic mesh nanostructures are made by electrochemical deposition using polymer templates made from photoresist. The polymer templates are fabricated with photoresist using two-beam interference holography and phase mask holography with three diffracted beams. Freestanding metallic mesh structures are made in two separate electrodepositions with perpendicular photoresist grating templates. Cu mesh square nanostructures having large (52.6) open areas are also made by single electrodeposition with a photoresist template made with a phase mask. These structures have potential as electrodes in photonic devices.

KW - complex nanostructures

KW - fabrication and characterization nanoscale materials

KW - holographic interferometry

KW - methods of micro- and nanofabrication

KW - photonic bandgap materials

UR - http://www.scopus.com/inward/record.url?scp=79551633866&partnerID=8YFLogxK

U2 - 10.1117/1.3541794

DO - 10.1117/1.3541794

M3 - Article

AN - SCOPUS:79551633866

VL - 10

JO - Journal of Micro/ Nanolithography, MEMS, and MOEMS

JF - Journal of Micro/ Nanolithography, MEMS, and MOEMS

SN - 1932-5150

IS - 1

M1 - 013011

ER -

Fabrication of submicron metallic grids with interference and phase-mask holography

Abstract

Keywords

ASJC Scopus subject areas

Access to Document

Other files and links

Cite this