TY - JOUR
T1 - Fabrication of superhydrophobic surfaces with nano-in-micro structures using UV-nanoimprint lithography and thermal shrinkage films
AU - Sung, Young Hoon
AU - Kim, Yang Doo
AU - Choi, Hak Jong
AU - Shin, Ryung
AU - Kang, Shinill
AU - Lee, Heon
N1 - Funding Information:
This work was supported by the Korea Evaluation Institute of Industrial Technology (KEIT) Research Grant of 2014 (‘10048973’), funded by the Ministry of Trade, Industry, and Energy (MOTIE, Korea). This research was supported by the Pioneer Research Center Program through the National Research Foundation of Korea funded by the Ministry of Science, ICT & Future Planning (NRF-2013M3C1A3063597).
Publisher Copyright:
© 2015 Elsevier B.V. All rights reserved.
PY - 2015/9/15
Y1 - 2015/9/15
N2 - After forming the nanoscale pillar patterns on the thermal shrinkage films (TSFs) with nano imprint lithography (NIL), the TSFs were shrunk. Thus, the nano- and microscale complex structures which have superhydrophobic and oleophobic surfaces with nano- and micro-patterns were created. The nano- and microscale complex-patterned (NMCP) TSFs were then coated with a self-assembled monolayer to reduce the surface energy of the structures. After the surface treatment, the contact angle of water on NMCP was measured to be 150.3°, with the films exhibiting self-cleaning behavior. We used the NMCP TSF as a master stamp. By using UV-nanoimprint lithography, the NMCP pattern of polyurethane acrylate was successfully duplicated on a glass substrate. The duplicated NMCP pattern from master stamp had a contact angle with water of 149.8° with superhydrophobicity.
AB - After forming the nanoscale pillar patterns on the thermal shrinkage films (TSFs) with nano imprint lithography (NIL), the TSFs were shrunk. Thus, the nano- and microscale complex structures which have superhydrophobic and oleophobic surfaces with nano- and micro-patterns were created. The nano- and microscale complex-patterned (NMCP) TSFs were then coated with a self-assembled monolayer to reduce the surface energy of the structures. After the surface treatment, the contact angle of water on NMCP was measured to be 150.3°, with the films exhibiting self-cleaning behavior. We used the NMCP TSF as a master stamp. By using UV-nanoimprint lithography, the NMCP pattern of polyurethane acrylate was successfully duplicated on a glass substrate. The duplicated NMCP pattern from master stamp had a contact angle with water of 149.8° with superhydrophobicity.
KW - Hierarchical structure
KW - Nano imprint lithography
KW - Super hydrophobic
KW - Thermal shrinkage film
UR - http://www.scopus.com/inward/record.url?scp=84937695708&partnerID=8YFLogxK
U2 - 10.1016/j.apsusc.2015.04.141
DO - 10.1016/j.apsusc.2015.04.141
M3 - Article
AN - SCOPUS:84937695708
SN - 0169-4332
VL - 349
SP - 169
EP - 173
JO - Applied Surface Science
JF - Applied Surface Science
ER -