Fabrication of TiO2 nano-to-microscale structures using UV nanoimprint lithography

Je Hong Choi, Han Byeol Jo, Hak Jong Choi, Heon Lee

Research output: Contribution to journalArticlepeer-review

19 Citations (Scopus)

Abstract

TiO2-nanoparticle-dispersed resin was prepared to form various nanoscaled structures using UV nanoimprint lithography (UV NIL). This resin - made of TiO2 nanoparticles, a monomer, solvent, and UV initiator - showed variations in refractive index depending on the nanoparticle concentration. TiO2 nano-to-microscale patterns were fabricated on various substrates such as Si wafer and glass, and even on flexible substrates, by using UV NIL, which offers advantages such as low cost, large area, and high throughput. Low-aspect-ratio, high-aspect-ratio, and microconvex patterns were fabricated using the NIL process. The optical properties of the patterns were analyzed using UV-vis spectrophotometry.

Original languageEnglish
Article number195301
JournalNanotechnology
Volume24
Issue number19
DOIs
Publication statusPublished - 2013 May 17

ASJC Scopus subject areas

  • Bioengineering
  • Chemistry(all)
  • Materials Science(all)
  • Mechanics of Materials
  • Mechanical Engineering
  • Electrical and Electronic Engineering

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