Facile and precise fabrication of 10-nm nanostructures on soft and hard substrates

Ju Yeon Woo, Sunghwan Jo, Jun Ho Oh, Ju Tae Kim, Chang-Soo Han

Research output: Contribution to journalArticle

Abstract

One of the major challenges in the field of nanotechnology is the facile and inexpensive fabrication of <10-nm nanostructures with a defect-free and precise pattern over a large area. Nanoimprint lithography (NIL) is a nanopatterning method that allows low-cost, fast production, and large-scale fabrication, but it needs improvement with regard to achieving a high resolution over a large area, processing on soft substrates, and nanomaterial patterning. Herein, it is demonstrated 10-nm patterning on soft and hard substrates via an advanced nanoimprint process. With a 100-nm master mold, both soft and hard molds with reduced pattern sizes (50, 20, 10, and 5 nm) are first fabricated using atomic layer deposition (ALD) of Al 2 O 3 . After surface functionalization of the mold, nanoscale patterns are imprinted on both hard (Si) and soft polyethylene terephthalate substrates, which result in structures with a pattern size of 10 nm. Using a hybrid supporting layer poly(methyl methacrylate) (PMMA)/poly(vinyl alcohol) (PVA) and ion sputter etching, a well-defined and clean sub-10 nm nanostructure is achieved for the nanomaterial on the substrate after lift-off and thermal annealing processes. Using this method, a graphene nanoribbon 10 nm wide is fabricated. Our approach is suitable for the fabrication of devices and structures with a 10-nm-scale pattern over a large area.

Original languageEnglish
Pages (from-to)317-325
Number of pages9
JournalApplied Surface Science
Volume484
DOIs
Publication statusPublished - 2019 Aug 1

Fingerprint

Nanostructures
Fabrication
Substrates
Nanostructured materials
Nanoimprint lithography
Nanoribbons
Carbon Nanotubes
Polyethylene Terephthalates
Graphite
Atomic layer deposition
Molds
Polymethyl Methacrylate
Polymethyl methacrylates
Nanotechnology
Polyethylene terephthalates
Graphene
Etching
Alcohols
Annealing
Ions

Keywords

  • Atomic layer deposition
  • Ion sputter etching
  • Mold
  • Nanofabrication
  • Nanoimprint lithography

ASJC Scopus subject areas

  • Surfaces, Coatings and Films

Cite this

Facile and precise fabrication of 10-nm nanostructures on soft and hard substrates. / Woo, Ju Yeon; Jo, Sunghwan; Oh, Jun Ho; Kim, Ju Tae; Han, Chang-Soo.

In: Applied Surface Science, Vol. 484, 01.08.2019, p. 317-325.

Research output: Contribution to journalArticle

Woo, Ju Yeon ; Jo, Sunghwan ; Oh, Jun Ho ; Kim, Ju Tae ; Han, Chang-Soo. / Facile and precise fabrication of 10-nm nanostructures on soft and hard substrates. In: Applied Surface Science. 2019 ; Vol. 484. pp. 317-325.
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