Facile routes to patterned surface neutralization layers for block copolymer lithography

Joona Bang, Joonwon Bae, Peter Lówenhielm, Christian Spiessberger, Susan A. Given-Beck, Thomas P. Russell, Craig J. Hawker

Research output: Contribution to journalArticle

139 Citations (Scopus)

Abstract

A more general approach to controlling interfacial and surface interactions through the use of an ultrathin crosslinkable film of a random copolymer has been developed. Novel functional materials for the fabrication of nanoscopic structures have been developed through the combination of controlled polymerization and latent side-chain reactivity. It was demonstrated that the use of azide groups offers a number of advantages for tuning the surface interaction. The azide group decomposes upon thermolysis or photolysis to form a reactive intrene, resulting in crosslinking of random copolymers, which was found to be very efficient, requiring very less time for complete crosslinking under either thermal or photochemical conditions. The use of photocrosslinkable material allows the convergence of bottom-up self-assembly of block copolymers and top-down photo-lithographic approaches, which is expected to open up new possibilities in the manufacture of various nanomaterials and devices.

Original languageEnglish
Pages (from-to)4552-4557
Number of pages6
JournalAdvanced Materials
Volume19
Issue number24
DOIs
Publication statusPublished - 2007 Dec 17

ASJC Scopus subject areas

  • Materials Science(all)
  • Mechanics of Materials
  • Mechanical Engineering

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    Bang, J., Bae, J., Lówenhielm, P., Spiessberger, C., Given-Beck, S. A., Russell, T. P., & Hawker, C. J. (2007). Facile routes to patterned surface neutralization layers for block copolymer lithography. Advanced Materials, 19(24), 4552-4557. https://doi.org/10.1002/adma.200701866