Feasibility study of solvent recycle process in spin-on hard mask material manufacturing system

Hyun Jae Jeong, Kiho Park, Dae Ryook Yang

Research output: Contribution to journalArticle

Abstract

The spin-on hard mask material for photo resist in semiconductor industry is usually obtained from a small-scale batch process. To obtain high purity products requires multiple-step purification processes, during which a large amount of organic solvent waste is emitted. In this study, a process for regenerating high purity solvent was proposed and the economic efficiency of the proposed process was analyzed. Also, a sensitivity analysis was performed to analyze the changing economics regarding the main variables. From the analysis, the break-even point can be achieved within one year for different cases considered. On the basis of 4-year operation, the profit margins for each case were determined and compared. It is concluded that the waste solvent regeneration process for spin-on hard mask material production in semiconductor industry is feasible and recommended.

Original languageEnglish
Pages (from-to)2375-2383
Number of pages9
JournalKorean Journal of Chemical Engineering
Volume32
Issue number12
DOIs
Publication statusPublished - 2015 Dec 1

Keywords

  • Economic Analysis
  • Regeneration
  • Sensitivity Analysis
  • Spin-on Hard Mask Material

ASJC Scopus subject areas

  • Chemistry(all)
  • Chemical Engineering(all)

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