Ferromagnetic resonance of dry etched permalloy thin films

S. D. Kim; J. J. Lee; K. H. Kim; S. H. Lim; H. J. Kim

doi:10.1109/intmag.1999.837459

Ferromagnetic resonance of dry etched permalloy thin films

S. D. Kim, J. J. Lee, K. H. Kim, S. H. Lim, H. J. Kim

Research output: Contribution to journal › Conference article › peer-review

Abstract

Ion beam etched or reactive ion etched permalloy (Ni₈₁Fe₁₉) thin films were studied by using ferromagnetic resonance (FMR). FMR was performed at 9.78 and 9.48 GHz for ion beam etching (IBE) and reactive ion etching (RIE). Finally, the results were compared with those of VSM and XRD measurement.

Original language	English
Pages (from-to)	DP-10
Journal	Digests of the Intermag Conference
DOIs	https://doi.org/10.1109/intmag.1999.837459
Publication status	Published - 1999
Externally published	Yes
Event	Proceedings of the 1999 IEEE International Magnetics Conference 'Digest of Intermag 99' - Kyongju, South Korea Duration: 1999 May 18 → 1999 May 21

ASJC Scopus subject areas

Electrical and Electronic Engineering

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10.1109/intmag.1999.837459

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title = "Ferromagnetic resonance of dry etched permalloy thin films",

abstract = "Ion beam etched or reactive ion etched permalloy (Ni81Fe19) thin films were studied by using ferromagnetic resonance (FMR). FMR was performed at 9.78 and 9.48 GHz for ion beam etching (IBE) and reactive ion etching (RIE). Finally, the results were compared with those of VSM and XRD measurement.",

author = "Kim, {S. D.} and Lee, {J. J.} and Kim, {K. H.} and Lim, {S. H.} and Kim, {H. J.}",

year = "1999",

doi = "10.1109/intmag.1999.837459",

language = "English",

pages = "DP--10",

journal = "Digests of the Intermag Conference",

issn = "0074-6843",

publisher = "Institute of Electrical and Electronics Engineers Inc.",

note = "Proceedings of the 1999 IEEE International Magnetics Conference 'Digest of Intermag 99' ; Conference date: 18-05-1999 Through 21-05-1999",

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TY - JOUR

T1 - Ferromagnetic resonance of dry etched permalloy thin films

AU - Kim, S. D.

AU - Lee, J. J.

AU - Kim, K. H.

AU - Lim, S. H.

AU - Kim, H. J.

PY - 1999

Y1 - 1999

N2 - Ion beam etched or reactive ion etched permalloy (Ni81Fe19) thin films were studied by using ferromagnetic resonance (FMR). FMR was performed at 9.78 and 9.48 GHz for ion beam etching (IBE) and reactive ion etching (RIE). Finally, the results were compared with those of VSM and XRD measurement.

AB - Ion beam etched or reactive ion etched permalloy (Ni81Fe19) thin films were studied by using ferromagnetic resonance (FMR). FMR was performed at 9.78 and 9.48 GHz for ion beam etching (IBE) and reactive ion etching (RIE). Finally, the results were compared with those of VSM and XRD measurement.

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U2 - 10.1109/intmag.1999.837459

DO - 10.1109/intmag.1999.837459

M3 - Conference article

AN - SCOPUS:0033298423

SN - 0074-6843

SP - DP-10

JO - Digests of the Intermag Conference

JF - Digests of the Intermag Conference

T2 - Proceedings of the 1999 IEEE International Magnetics Conference 'Digest of Intermag 99'

Y2 - 18 May 1999 through 21 May 1999

ER -

Ferromagnetic resonance of dry etched permalloy thin films

Abstract

ASJC Scopus subject areas

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