Ferromagnetic resonance of dry etched permalloy thin films

S. D. Kim, J. J. Lee, K. H. Kim, S. H. Lim, H. J. Kim

Research output: Contribution to journalConference article

Abstract

Ion beam etched or reactive ion etched permalloy (Ni81Fe19) thin films were studied by using ferromagnetic resonance (FMR). FMR was performed at 9.78 and 9.48 GHz for ion beam etching (IBE) and reactive ion etching (RIE). Finally, the results were compared with those of VSM and XRD measurement.

Original languageEnglish
Pages (from-to)DP-10
JournalDigests of the Intermag Conference
DOIs
Publication statusPublished - 1999
Externally publishedYes
EventProceedings of the 1999 IEEE International Magnetics Conference 'Digest of Intermag 99' - Kyongju, South Korea
Duration: 1999 May 181999 May 21

ASJC Scopus subject areas

  • Electrical and Electronic Engineering

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