Ion beam etched or reactive ion etched permalloy (Ni81Fe19) thin films were studied by using ferromagnetic resonance (FMR). FMR was performed at 9.78 and 9.48 GHz for ion beam etching (IBE) and reactive ion etching (RIE). Finally, the results were compared with those of VSM and XRD measurement.
|Journal||Digests of the Intermag Conference|
|Publication status||Published - 1999|
|Event||Proceedings of the 1999 IEEE International Magnetics Conference 'Digest of Intermag 99' - Kyongju, South Korea|
Duration: 1999 May 18 → 1999 May 21
ASJC Scopus subject areas
- Electrical and Electronic Engineering