Ferromagnetic resonance of dry etched permalloy thin films

S. D. Kim, J. J. Lee, K. H. Kim, Sang Ho Lim, H. J. Kim

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

Ion beam etched or reactive ion etched permalloy (Ni 81Fe 19) thin films were studied by using ferromagnetic resonance (FMR). FMR was performed at 9.78 and 9.48 GHz for ion beam etching (IBE) and reactive ion etching (RIE). Finally, the results were compared with those of VSM and XRD measurement.

Original languageEnglish
Title of host publicationDigests of the Intermag Conference
PublisherIEEE
Publication statusPublished - 1999
Externally publishedYes
EventProceedings of the 1999 IEEE International Magnetics Conference 'Digest of Intermag 99' - Kyongju, South Korea
Duration: 1999 May 181999 May 21

Other

OtherProceedings of the 1999 IEEE International Magnetics Conference 'Digest of Intermag 99'
CityKyongju, South Korea
Period99/5/1899/5/21

ASJC Scopus subject areas

  • Electrical and Electronic Engineering

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  • Cite this

    Kim, S. D., Lee, J. J., Kim, K. H., Lim, S. H., & Kim, H. J. (1999). Ferromagnetic resonance of dry etched permalloy thin films. In Digests of the Intermag Conference IEEE.