Formation of high aspect ratio fused silica nanowalls by fluorine-based deep reactive ion etching

Jung Rae Park, Aaron Berndt, Young Keun Kim, Ji Sung Lee, Jong Eun Ryu, Daniel Sunghoi Choi

Research output: Contribution to journalArticlepeer-review

4 Citations (Scopus)

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Engineering & Materials Science

Physics & Astronomy

Chemical Compounds