Formation of induced anisotropy in amorphous Sm-Fe based thin films by field sputtering

Sang Ho Lim, S. H. Han, H. J. Kim, S. H. Song, D. Lee

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Abstract

Induced anisotropy with a large energy of 6 × 104 J/m3 is formed in an amorphous Sm-Fe based thin film by sputtering under an applied magnetic field of 500-600 Oe. The induced anisotropy results in a large anisotropy in magnetostriction, a strain anisotropy ratio reaching as high as 35, although intrinsic magnetostriction is affected only slightly. The large strain anisotropy allows one to realize a large strain in a particular direction and, hence, it is of significant practical importance. Induced anisotropy is also found to be formed by postannealing under applied magnetic field, but the magnitude of anisotropy energy formed is very small.

Original languageEnglish
Pages (from-to)5801-5803
Number of pages3
JournalJournal of Applied Physics
Volume87
Issue number9 II
Publication statusPublished - 2000 May 1
Externally publishedYes

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ASJC Scopus subject areas

  • Physics and Astronomy(all)
  • Physics and Astronomy (miscellaneous)

Cite this

Lim, S. H., Han, S. H., Kim, H. J., Song, S. H., & Lee, D. (2000). Formation of induced anisotropy in amorphous Sm-Fe based thin films by field sputtering. Journal of Applied Physics, 87(9 II), 5801-5803.