Formation of TiO2 nanopattern using reverse imprinting and sol-gel method

Kyung Min Yoon, Ki Yeon Yang, Heon Lee, Hyeong Seok Kim

Research output: Contribution to journalArticlepeer-review

16 Citations (Scopus)


TiO2 and its nanopattern fabrication have been studied intensively because of its wide band gap and photocatalystic nature. TiO 2 nanopatterns can be made by conventional patterning techniques, consisting of deposition, photolithography, and etching processes. However, these processes include complicated and expensive process steps, such as photolithography. Therefore, a simpler and more economic process is needed. In this work, TiO2 nanopatterns were fabricated using reverse-imprint lithography and the sol-gel method. Ethanol based TiO2 sol was prepared using tetrabuthylorthotitanate (C16H36O 4 Ti) and diethanolamine (C4H11NO2). TiO2 sol was then coated on the surface of the replicated polymer mold of hard-polydimethylsiloxane and polydimethylsiloxane by spin coating and transferred to the substrate by the reverse imprinting process at 200 °C. A postimprint annealing process was subsequently carried out to form the TiO 2 polycrystalline phase. The x-ray diffraction and x-ray photoelectron spectroscopy results confirmed that the transferred TiO 2 nanopattern was chemically pure polycrystalline TiO2.

Original languageEnglish
Pages (from-to)2810-2813
Number of pages4
JournalJournal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Issue number6
Publication statusPublished - 2009

ASJC Scopus subject areas

  • Condensed Matter Physics
  • Electrical and Electronic Engineering


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