Free-standing GaN layer by combination of electrochemical and photo-electrochemical etching

Lee Woon Jang, Dae Woo Jeon, Alexander Y. Polyakov, Han Su Cho, Jin Hyeon Yun, Dong Seob Jo, Jin Woo Ju, Jong Hyeob Baek, In-Hwan Lee

Research output: Contribution to journalArticle

14 Citations (Scopus)

Abstract

A free-standing GaN layer was produced by combining electrochemical (EC) etching from the front surface, photo-electrochemical (PEC) etching from the back surface, and subsequent regrowth of GaN on the porous template thus produced. The EC etching resulted in the formation of etch channels on the surface portion of the starting film, whereas the back-side PEC etching gave rise to a columnar structure supporting the entire film. When the n-GaN layer was regrown on such template, the underlying columnar structure provided weak places for easy separation and transfer of the film by mechanical bonding.

Original languageEnglish
Article number061001
JournalApplied Physics Express
Volume6
Issue number6
DOIs
Publication statusPublished - 2013 Jun 1
Externally publishedYes

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Electrochemical etching
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ASJC Scopus subject areas

  • Engineering(all)
  • Physics and Astronomy(all)

Cite this

Free-standing GaN layer by combination of electrochemical and photo-electrochemical etching. / Jang, Lee Woon; Jeon, Dae Woo; Polyakov, Alexander Y.; Cho, Han Su; Yun, Jin Hyeon; Jo, Dong Seob; Ju, Jin Woo; Baek, Jong Hyeob; Lee, In-Hwan.

In: Applied Physics Express, Vol. 6, No. 6, 061001, 01.06.2013.

Research output: Contribution to journalArticle

Jang, LW, Jeon, DW, Polyakov, AY, Cho, HS, Yun, JH, Jo, DS, Ju, JW, Baek, JH & Lee, I-H 2013, 'Free-standing GaN layer by combination of electrochemical and photo-electrochemical etching', Applied Physics Express, vol. 6, no. 6, 061001. https://doi.org/10.7567/APEX.6.061001
Jang, Lee Woon ; Jeon, Dae Woo ; Polyakov, Alexander Y. ; Cho, Han Su ; Yun, Jin Hyeon ; Jo, Dong Seob ; Ju, Jin Woo ; Baek, Jong Hyeob ; Lee, In-Hwan. / Free-standing GaN layer by combination of electrochemical and photo-electrochemical etching. In: Applied Physics Express. 2013 ; Vol. 6, No. 6.
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