Abstract
An explicit surface potential calculation method of gate-all-around MOSFET (GAAMOSFET) devices which takes into account both interface trap charge and varying doping levels is presented. The results of the method are extensively verified by numerical simulation. Results from the model are used to find qualitative and quantitative effect of interface trap charge on subthreshold slope (SS) of GAAMOSFET devices. Further, design constraints of GAAMOSFET devices with emphasis on the effect of interface trap charge on device SS performance are investigated.
Original language | English |
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Pages (from-to) | 530-537 |
Number of pages | 8 |
Journal | Journal of Semiconductor Technology and Science |
Volume | 13 |
Issue number | 5 |
DOIs | |
Publication status | Published - 2013 Oct |
Keywords
- Compact model
- Drain-source current
- Gate-all-around metal-oxide-semiconductor-field-effect-transistor (GAAMOSFET)
- Interface trap distribution
- Scaling theory
ASJC Scopus subject areas
- Electronic, Optical and Magnetic Materials
- Electrical and Electronic Engineering