Graphoepitaxial Assembly of Block Copolymer for Bending Stripe Patterns

June Huh; Mi Jeong Kim; Jong Wan Park

doi:10.1002/mats.201900009

Graphoepitaxial Assembly of Block Copolymer for Bending Stripe Patterns

June Huh, Mi Jeong Kim, Jong Wan Park

Research output: Contribution to journal › Article › peer-review

1 Citation (Scopus)

Abstract

The formation of bend patterns using block copolymer (BCP) lamellae within trench-type groove patterned with bend geometry is simulated by using a Monte Carlo simulation and a strong segregation theory. A tolerance of curvatures at the bend corners of the guide pattern for the formation of bent lamellae is proposed. It is found from the simulation and the strong segregation theory that the tolerance for the difference in curvature radii of two bend corners for the well-patterned lamellar bends is proportional to the inverse of the trench width in the straight region.

Original language	English
Article number	1900009
Journal	Macromolecular Theory and Simulations
Volume	28
Issue number	4
DOIs	https://doi.org/10.1002/mats.201900009
Publication status	Published - 2019 Jul

Keywords

block copolymer
directed self-assembly
monte carlo simulation
nanopatterning

ASJC Scopus subject areas

Condensed Matter Physics
Organic Chemistry
Polymers and Plastics
Inorganic Chemistry
Materials Chemistry

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10.1002/mats.201900009

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title = "Graphoepitaxial Assembly of Block Copolymer for Bending Stripe Patterns",

abstract = "The formation of bend patterns using block copolymer (BCP) lamellae within trench-type groove patterned with bend geometry is simulated by using a Monte Carlo simulation and a strong segregation theory. A tolerance of curvatures at the bend corners of the guide pattern for the formation of bent lamellae is proposed. It is found from the simulation and the strong segregation theory that the tolerance for the difference in curvature radii of two bend corners for the well-patterned lamellar bends is proportional to the inverse of the trench width in the straight region.",

keywords = "block copolymer, directed self-assembly, monte carlo simulation, nanopatterning",

author = "June Huh and Kim, {Mi Jeong} and Park, {Jong Wan}",

note = "Funding Information: This work was supported by a grant from the National Research Foundation of Korea (2017R1A4A1015015 and 2018M3D1A1058536) and Samsung Advanced Institute of Technology. This work was initiated by the support from Samsung Advanced Institute of Technology when J.H. was affiliated with Department of Material Science and Engineering, Yonsei University.",

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AU - Kim, Mi Jeong

AU - Park, Jong Wan

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N2 - The formation of bend patterns using block copolymer (BCP) lamellae within trench-type groove patterned with bend geometry is simulated by using a Monte Carlo simulation and a strong segregation theory. A tolerance of curvatures at the bend corners of the guide pattern for the formation of bent lamellae is proposed. It is found from the simulation and the strong segregation theory that the tolerance for the difference in curvature radii of two bend corners for the well-patterned lamellar bends is proportional to the inverse of the trench width in the straight region.

AB - The formation of bend patterns using block copolymer (BCP) lamellae within trench-type groove patterned with bend geometry is simulated by using a Monte Carlo simulation and a strong segregation theory. A tolerance of curvatures at the bend corners of the guide pattern for the formation of bent lamellae is proposed. It is found from the simulation and the strong segregation theory that the tolerance for the difference in curvature radii of two bend corners for the well-patterned lamellar bends is proportional to the inverse of the trench width in the straight region.

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KW - directed self-assembly

KW - monte carlo simulation

KW - nanopatterning

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