Growth behavior and electrical properties of a (Na0.5K 0.5)NbO3thin film deposited on a Pt/Ti/SiO2/Si substrate using RFmagnetron sputtering

Lee Seung Kang, Bo Yun Kim, In Tae Seo, Tae Geun Seong, Jin Seong Kim, Jong Woo Sun, Dong Soo Paik, Inrok Hwang, Bae Ho Park, Sahn Nahm

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