HgTe nanocrystal-based thin-film transistors fabricated on glass substrates

Hyunsuk Kim, Dong Won Kim, Kyoungah Cho, Sangsig Kim

Research output: Contribution to journalArticle

10 Citations (Scopus)

Abstract

HgTe nanocrystal-based thin-film transistors (TFTs) with Al2 O3 top-gate dielectrics were fabricated on glass substrates using sintered HgTe nanocrystals as the channel layers. To the best of our knowledge, this is the first report on the fabrication of nanocrystal-based TFTs on glass substrates. Colloidal HgTe nanocrystal films were first formed on the glass substrates by spin-coating. The HgTe nanocrystal films were then sintered at 150 °C, leading to a dramatic increase in their conductance, compared with the as-deposited films. The TFTs fabricated in this letter exhibit the typical characteristics of p-channel transistors with a field-effect mobility of 1.04 cm2/V.s, a threshold voltage of +0.2 V, and an ON/OFF current ratio of 1 × 103. These results suggest that spin-coating and sintering at a low temperature enable the simple and low-cost fabrication of nanocrystal-based TFTs on glass substrates.

Original languageEnglish
Pages (from-to)42-44
Number of pages3
JournalIEEE Electron Device Letters
Volume28
Issue number1
DOIs
Publication statusPublished - 2007 Jan

Keywords

  • AlO
  • HgTe nanocrystal
  • Solution process
  • Thin-film transistor (TFT)

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Electrical and Electronic Engineering

Fingerprint Dive into the research topics of 'HgTe nanocrystal-based thin-film transistors fabricated on glass substrates'. Together they form a unique fingerprint.

  • Cite this