Hierarchical ordering of block copolymer nanostructures by solvent annealing combined with controlled dewetting

Tae Hee Kim, Jiyoung Hwang, Won Seok Hwang, June Huh, Ho Cheol Kim, Seung Hyun Kim, Jae Min Hong, Edwin L. Thomas, Cheolmin Park

Research output: Contribution to journalArticle

63 Citations (Scopus)

Abstract

A study was conducted to analyze a facile method for fabricating a highly ordered nanostructure of a poly[styrene-block-(ethylene oxide)] (PS-b-PEO) block copolymer by solvent annealing combined with microcontact printing lithography. A micro-patterned PS-b-PEO thin film is prepared by spin casting block copolymer solution on a substrate pre-patterned with self assembled monolayers (SAM) by microcontact printing. The dewetting of the block copolymer film during the solvent annealing for assisting the ordering of block copolymer domains was strictly confined into the micro-patterned regions, leading to a regularly arrayed set of convex lens shaped spherical caps over 1 mm2 area where each dewetted domain was composed of nearly single crystal of spherical PEO microdomains. The ordered hierarchical structure was also conveniently formed by the combination of block copolymer self assembly and controlled dewetting with the scale from nanometer, micrometer to millimeter.

Original languageEnglish
Pages (from-to)522-527
Number of pages6
JournalAdvanced Materials
Volume20
Issue number3
DOIs
Publication statusPublished - 2008 Feb 4
Externally publishedYes

Fingerprint

Block copolymers
Nanostructures
Annealing
Polyethylene oxides
Printing
Ethylene Oxide
Styrene
Self assembled monolayers
Self assembly
Lithography
Lenses
Ethylene
Casting
Single crystals
Thin films
Oxides
Substrates
polystyrene-b-poly(ethylene oxide)

ASJC Scopus subject areas

  • Materials Science(all)
  • Mechanics of Materials
  • Mechanical Engineering

Cite this

Hierarchical ordering of block copolymer nanostructures by solvent annealing combined with controlled dewetting. / Kim, Tae Hee; Hwang, Jiyoung; Hwang, Won Seok; Huh, June; Kim, Ho Cheol; Kim, Seung Hyun; Hong, Jae Min; Thomas, Edwin L.; Park, Cheolmin.

In: Advanced Materials, Vol. 20, No. 3, 04.02.2008, p. 522-527.

Research output: Contribution to journalArticle

Kim, TH, Hwang, J, Hwang, WS, Huh, J, Kim, HC, Kim, SH, Hong, JM, Thomas, EL & Park, C 2008, 'Hierarchical ordering of block copolymer nanostructures by solvent annealing combined with controlled dewetting', Advanced Materials, vol. 20, no. 3, pp. 522-527. https://doi.org/10.1002/adma.200700651
Kim, Tae Hee ; Hwang, Jiyoung ; Hwang, Won Seok ; Huh, June ; Kim, Ho Cheol ; Kim, Seung Hyun ; Hong, Jae Min ; Thomas, Edwin L. ; Park, Cheolmin. / Hierarchical ordering of block copolymer nanostructures by solvent annealing combined with controlled dewetting. In: Advanced Materials. 2008 ; Vol. 20, No. 3. pp. 522-527.
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