TY - JOUR
T1 - High-Fidelity, Sub-5 nm Patterns from High-χ Block Copolymer Films with Vapor-Deposited Ultrathin, Cross-Linked Surface-Modification Layers
AU - Wang, Hyun Suk
AU - Oh, Seula
AU - Choi, Junhwan
AU - Jang, Wontae
AU - Kim, Ki Hyun
AU - Arellano, Carlos Luis
AU - Huh, June
AU - Bang, Joona
AU - Im, Sung Gap
N1 - Funding Information:
H.S.W. and S.O. contributed equally to this work. This work was supported by the National Research Foundation of Korea (NRF) grant funded by the Korea government (MSIT) (No. 2018R1A2B2004508, 2017R1A2B3007806), by Creative Materials Discovery Program through NRF grant funded by MSIT (2018M3D1A1058536), and the Wearable Platform Materials Technology Center through NRF grant funded by MSIT (No. 2016R1A5A1009926).
Publisher Copyright:
© 2020 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim
PY - 2020/2/1
Y1 - 2020/2/1
N2 - Despite their capability, sub-10 nm periodic nano-patterns formed by strongly segregating block copolymer (BCP) thin films cannot be easily oriented perpendicular to the substrate due to the huge surface energy differences of the constituent blocks. To produce perpendicular nano-patterns, the interfacial energies of both the substrate and free interfaces should be controlled precisely to induce non-preferential wetting. Unfortunately, high-performance surface modification layers are challenging to design, and different kinds of surface modification methods must be devised respectively for each neutral layer and top coat. Furthermore, conventional approaches, largely based on spin-coating processes, are highly prone to defect formation and may readily cause dewetting at sub-10 nm thickness. To date, these obstacles have hampered the development of high-fidelity, sub-5 nm BCP patterns. Herein, an all-vapor phase deposition approach initiated chemical vapor deposition is demonstrated to form 9-nm-thick, uniform neutral bottom layer and top coat with exquisite control of composition and thickness. These layers are employed in BCP films to produce perpendicular cylinders with a diameter of ≈4 nm that propagate throughout a BCP thickness of up to ≈60 nm, corresponding to five natural domain spacings of the BCP. Such a robust approach will serve as an advancement for the reliable generation of sub-10 nm nano-patterns.
AB - Despite their capability, sub-10 nm periodic nano-patterns formed by strongly segregating block copolymer (BCP) thin films cannot be easily oriented perpendicular to the substrate due to the huge surface energy differences of the constituent blocks. To produce perpendicular nano-patterns, the interfacial energies of both the substrate and free interfaces should be controlled precisely to induce non-preferential wetting. Unfortunately, high-performance surface modification layers are challenging to design, and different kinds of surface modification methods must be devised respectively for each neutral layer and top coat. Furthermore, conventional approaches, largely based on spin-coating processes, are highly prone to defect formation and may readily cause dewetting at sub-10 nm thickness. To date, these obstacles have hampered the development of high-fidelity, sub-5 nm BCP patterns. Herein, an all-vapor phase deposition approach initiated chemical vapor deposition is demonstrated to form 9-nm-thick, uniform neutral bottom layer and top coat with exquisite control of composition and thickness. These layers are employed in BCP films to produce perpendicular cylinders with a diameter of ≈4 nm that propagate throughout a BCP thickness of up to ≈60 nm, corresponding to five natural domain spacings of the BCP. Such a robust approach will serve as an advancement for the reliable generation of sub-10 nm nano-patterns.
KW - block copolymer thin films
KW - initiated chemical vapor deposition
KW - microdomain orientation
KW - sub-5 nm nano-patterns
KW - top coat
UR - http://www.scopus.com/inward/record.url?scp=85078658622&partnerID=8YFLogxK
U2 - 10.1002/marc.201900514
DO - 10.1002/marc.201900514
M3 - Article
C2 - 31958190
AN - SCOPUS:85078658622
VL - 41
JO - Macromolecular Rapid Communications
JF - Macromolecular Rapid Communications
SN - 1022-1336
IS - 4
M1 - 1900514
ER -