High post-annealing stability in [Pt/Co] multilayers

Tae Young Lee, Dong Su Son, Sang Ho Lim, Seong Rae Lee

Research output: Contribution to journalArticle

19 Citations (Scopus)

Abstract

The [Pt/Co] multilayers with a very thin Pt layer of 0.2 nm are presented that exhibit strong perpendicular magnetic anisotropy (PMA) even after annealing up to 500 °C. The observed post-annealing stability is in significant contrast to that previously shown for conventional multilayers with a thicker Pt layer than Co, where good PMA properties are obtained in the as-deposited state but they deteriorate significantly at moderate annealing temperatures below ∼300 °C. The reason for the high post-annealing stability is a low level of intermixing during sputtering due to the very thin Pt layer.

Original languageEnglish
Article number216102
JournalJournal of Applied Physics
Volume113
Issue number21
DOIs
Publication statusPublished - 2013 Jun 7

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annealing
anisotropy
sputtering
temperature

ASJC Scopus subject areas

  • Physics and Astronomy(all)

Cite this

High post-annealing stability in [Pt/Co] multilayers. / Lee, Tae Young; Son, Dong Su; Lim, Sang Ho; Lee, Seong Rae.

In: Journal of Applied Physics, Vol. 113, No. 21, 216102, 07.06.2013.

Research output: Contribution to journalArticle

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AB - The [Pt/Co] multilayers with a very thin Pt layer of 0.2 nm are presented that exhibit strong perpendicular magnetic anisotropy (PMA) even after annealing up to 500 °C. The observed post-annealing stability is in significant contrast to that previously shown for conventional multilayers with a thicker Pt layer than Co, where good PMA properties are obtained in the as-deposited state but they deteriorate significantly at moderate annealing temperatures below ∼300 °C. The reason for the high post-annealing stability is a low level of intermixing during sputtering due to the very thin Pt layer.

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