High-resolution patterning of various large-area, highly ordered structural motifs by directional photofluidization lithography

Sub-30-nm line, ellipsoid, rectangle, and circle arrays

Seungwoo Lee, Hong Suk Kang, Jung Ki Park

Research output: Contribution to journalArticle

43 Citations (Scopus)

Abstract

A major challenge in nanolithography is to overcome the resolution limit of conventional patterning methods. Herein, we demonstrate a simple and convenient approach to generate sub-30-nm various structural motifs with precisely controlled sizes, shapes, and orientations. The proposed method, the "directional photofluidization" of an azopolymer, follows the same philosophy as a path-changing approach, for example, thermal-reflow of polymer arrays, in that post-treatment simultaneously leads to a reduction of the feature sizes and line-edge roughness (LER) of nanostructures. However, in contrast to thermal-induced isotropic reflow, directional photofluidization provides unprecedented flexibility to control the structural features, because the direction of photofluidization can be arbitrary controlled according to the light polarization. Furthermore, this approach offers good control of the final features due to a gradual reduction in the rate of photofluidization during light irradiation. More importantly, the photofluidic behavior of the azopolymer significantly reduces the LER, and thus it can improve the quality of nanostructures. Finally, the far-field process of directional photofluidization enables hierarchical nanofabrication, in contrast to mechanical contact fabrication, because the patterned light can reconfigure the polymer arrays selectively. Our approach is potentially advantageous for the fabrication of various structural motifs with well-controlled dimensions on the nanoscale and with minimized LER.

Original languageEnglish
Pages (from-to)1770-1778
Number of pages9
JournalAdvanced Functional Materials
Volume21
Issue number10
DOIs
Publication statusPublished - 2011 May 24

Fingerprint

rectangles
ellipsoids
Lithography
roughness
lithography
Surface roughness
Nanostructures
high resolution
Polymers
Nanolithography
Fabrication
fabrication
nanofabrication
polymers
Light polarization
Nanotechnology
far fields
flexibility
Irradiation
irradiation

Keywords

  • azopolymer
  • directional photofluidization
  • hierarchical structures
  • line-edge roughness
  • polarization-dependence

ASJC Scopus subject areas

  • Chemistry(all)
  • Materials Science(all)
  • Condensed Matter Physics

Cite this

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title = "High-resolution patterning of various large-area, highly ordered structural motifs by directional photofluidization lithography: Sub-30-nm line, ellipsoid, rectangle, and circle arrays",
abstract = "A major challenge in nanolithography is to overcome the resolution limit of conventional patterning methods. Herein, we demonstrate a simple and convenient approach to generate sub-30-nm various structural motifs with precisely controlled sizes, shapes, and orientations. The proposed method, the {"}directional photofluidization{"} of an azopolymer, follows the same philosophy as a path-changing approach, for example, thermal-reflow of polymer arrays, in that post-treatment simultaneously leads to a reduction of the feature sizes and line-edge roughness (LER) of nanostructures. However, in contrast to thermal-induced isotropic reflow, directional photofluidization provides unprecedented flexibility to control the structural features, because the direction of photofluidization can be arbitrary controlled according to the light polarization. Furthermore, this approach offers good control of the final features due to a gradual reduction in the rate of photofluidization during light irradiation. More importantly, the photofluidic behavior of the azopolymer significantly reduces the LER, and thus it can improve the quality of nanostructures. Finally, the far-field process of directional photofluidization enables hierarchical nanofabrication, in contrast to mechanical contact fabrication, because the patterned light can reconfigure the polymer arrays selectively. Our approach is potentially advantageous for the fabrication of various structural motifs with well-controlled dimensions on the nanoscale and with minimized LER.",
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T1 - High-resolution patterning of various large-area, highly ordered structural motifs by directional photofluidization lithography

T2 - Sub-30-nm line, ellipsoid, rectangle, and circle arrays

AU - Lee, Seungwoo

AU - Kang, Hong Suk

AU - Park, Jung Ki

PY - 2011/5/24

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N2 - A major challenge in nanolithography is to overcome the resolution limit of conventional patterning methods. Herein, we demonstrate a simple and convenient approach to generate sub-30-nm various structural motifs with precisely controlled sizes, shapes, and orientations. The proposed method, the "directional photofluidization" of an azopolymer, follows the same philosophy as a path-changing approach, for example, thermal-reflow of polymer arrays, in that post-treatment simultaneously leads to a reduction of the feature sizes and line-edge roughness (LER) of nanostructures. However, in contrast to thermal-induced isotropic reflow, directional photofluidization provides unprecedented flexibility to control the structural features, because the direction of photofluidization can be arbitrary controlled according to the light polarization. Furthermore, this approach offers good control of the final features due to a gradual reduction in the rate of photofluidization during light irradiation. More importantly, the photofluidic behavior of the azopolymer significantly reduces the LER, and thus it can improve the quality of nanostructures. Finally, the far-field process of directional photofluidization enables hierarchical nanofabrication, in contrast to mechanical contact fabrication, because the patterned light can reconfigure the polymer arrays selectively. Our approach is potentially advantageous for the fabrication of various structural motifs with well-controlled dimensions on the nanoscale and with minimized LER.

AB - A major challenge in nanolithography is to overcome the resolution limit of conventional patterning methods. Herein, we demonstrate a simple and convenient approach to generate sub-30-nm various structural motifs with precisely controlled sizes, shapes, and orientations. The proposed method, the "directional photofluidization" of an azopolymer, follows the same philosophy as a path-changing approach, for example, thermal-reflow of polymer arrays, in that post-treatment simultaneously leads to a reduction of the feature sizes and line-edge roughness (LER) of nanostructures. However, in contrast to thermal-induced isotropic reflow, directional photofluidization provides unprecedented flexibility to control the structural features, because the direction of photofluidization can be arbitrary controlled according to the light polarization. Furthermore, this approach offers good control of the final features due to a gradual reduction in the rate of photofluidization during light irradiation. More importantly, the photofluidic behavior of the azopolymer significantly reduces the LER, and thus it can improve the quality of nanostructures. Finally, the far-field process of directional photofluidization enables hierarchical nanofabrication, in contrast to mechanical contact fabrication, because the patterned light can reconfigure the polymer arrays selectively. Our approach is potentially advantageous for the fabrication of various structural motifs with well-controlled dimensions on the nanoscale and with minimized LER.

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