High temperature isothermal oxidation behavior of NbSi2 coating at 1000–1450 °C

Young Jun Choi; Jin Kook Yoon; Gyeung Ho Kim; Woo Young Yoon; Jung Man Doh; Kyung Tae Hong

doi:10.1016/j.corsci.2017.10.002

High temperature isothermal oxidation behavior of NbSi₂ coating at 1000–1450 °C

Young Jun Choi, Jin Kook Yoon, Gyeung Ho Kim, Woo Young Yoon, Jung Man Doh, Kyung Tae Hong

Department of Materials Science and Engineering

Research output: Contribution to journal › Article › peer-review

18 Citations (Scopus)

Abstract

Isothermal oxidation behavior of NbSi₂ coating grown on Nb substrate was investigated in air at 1000–1450 °C. Oxidation rate of NbSi₂ coating increased with temperature at 1000–1300 °C but opposite trend was observed at 1300–1450 °C. Maximum oxidation rate was obtained at 1300 °C due to the highest porosity of oxide scale. Lowest oxidation rate was observed at 1450 °C due to formation of dense oxide scale by combined effect of volatilization of Nb oxide phase, viscous flow and densification of c-SiO₂. Oxidation resistance of NbSi₂ coating at these temperatures was governed by some inter-related factors.

Original language	English
Pages (from-to)	102-114
Number of pages	13
Journal	Corrosion Science
Volume	129
DOIs	https://doi.org/10.1016/j.corsci.2017.10.002
Publication status	Published - 2017 Dec

Keywords

A. Intermetallics
B. SEM
B. TEM
B. XRD
C. Oxidation

ASJC Scopus subject areas

Chemistry(all)
Chemical Engineering(all)
Materials Science(all)

Access to Document

10.1016/j.corsci.2017.10.002

Fingerprint Dive into the research topics of 'High temperature isothermal oxidation behavior of NbSi<sub>2</sub> coating at 1000–1450 °C'. Together they form a unique fingerprint.

Cite this

@article{1763ec2ece3d4828acab900a4fd08dd5,

title = "High temperature isothermal oxidation behavior of NbSi2 coating at 1000–1450 °C",

abstract = "Isothermal oxidation behavior of NbSi2 coating grown on Nb substrate was investigated in air at 1000–1450 °C. Oxidation rate of NbSi2 coating increased with temperature at 1000–1300 °C but opposite trend was observed at 1300–1450 °C. Maximum oxidation rate was obtained at 1300 °C due to the highest porosity of oxide scale. Lowest oxidation rate was observed at 1450 °C due to formation of dense oxide scale by combined effect of volatilization of Nb oxide phase, viscous flow and densification of c-SiO2. Oxidation resistance of NbSi2 coating at these temperatures was governed by some inter-related factors.",

keywords = "A. Intermetallics, B. SEM, B. TEM, B. XRD, C. Oxidation",

author = "Choi, {Young Jun} and Yoon, {Jin Kook} and Kim, {Gyeung Ho} and Yoon, {Woo Young} and Doh, {Jung Man} and Hong, {Kyung Tae}",

year = "2017",

month = dec,

doi = "10.1016/j.corsci.2017.10.002",

language = "English",

volume = "129",

pages = "102--114",

journal = "Corrosion Science",

issn = "0010-938X",

publisher = "Elsevier Limited",

}

TY - JOUR

T1 - High temperature isothermal oxidation behavior of NbSi2 coating at 1000–1450 °C

AU - Choi, Young Jun

AU - Yoon, Jin Kook

AU - Kim, Gyeung Ho

AU - Yoon, Woo Young

AU - Doh, Jung Man

AU - Hong, Kyung Tae

PY - 2017/12

Y1 - 2017/12

N2 - Isothermal oxidation behavior of NbSi2 coating grown on Nb substrate was investigated in air at 1000–1450 °C. Oxidation rate of NbSi2 coating increased with temperature at 1000–1300 °C but opposite trend was observed at 1300–1450 °C. Maximum oxidation rate was obtained at 1300 °C due to the highest porosity of oxide scale. Lowest oxidation rate was observed at 1450 °C due to formation of dense oxide scale by combined effect of volatilization of Nb oxide phase, viscous flow and densification of c-SiO2. Oxidation resistance of NbSi2 coating at these temperatures was governed by some inter-related factors.

AB - Isothermal oxidation behavior of NbSi2 coating grown on Nb substrate was investigated in air at 1000–1450 °C. Oxidation rate of NbSi2 coating increased with temperature at 1000–1300 °C but opposite trend was observed at 1300–1450 °C. Maximum oxidation rate was obtained at 1300 °C due to the highest porosity of oxide scale. Lowest oxidation rate was observed at 1450 °C due to formation of dense oxide scale by combined effect of volatilization of Nb oxide phase, viscous flow and densification of c-SiO2. Oxidation resistance of NbSi2 coating at these temperatures was governed by some inter-related factors.

KW - A. Intermetallics

KW - B. SEM

KW - B. TEM

KW - B. XRD

KW - C. Oxidation

UR - http://www.scopus.com/inward/record.url?scp=85031317166&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=85031317166&partnerID=8YFLogxK

U2 - 10.1016/j.corsci.2017.10.002

DO - 10.1016/j.corsci.2017.10.002

M3 - Article

AN - SCOPUS:85031317166

VL - 129

SP - 102

EP - 114

JO - Corrosion Science

JF - Corrosion Science

SN - 0010-938X

ER -