Highly conformal SiO2/Al2O3 nanolaminate gas-diffusion barriers for large-area flexible electronics applications

Jin Hwan Choi, Young Min Kim, Young Wook Park, Tae Hyun Park, Jin Wook Jeong, Hyun Ju Choi, Eun Ho Song, Jin Woo Lee, Cheol Ho Kim, Byeong Kwon Ju

Research output: Contribution to journalArticlepeer-review

50 Citations (Scopus)


The present study demonstrates a flexible gas-diffusion barrier film, containing an SiO2/Al2O3 nanolaminate on a plastic substrate. Highly uniform and conformal coatings can be made by alternating the exposure of a flexible polyethersulfone surface to vapors of SiO2 and Al2O3, at nanoscale thickness cycles via RF-magnetron sputtering deposition. The calcium degradation test indicates that 24 cycles of a 10/10 nm inorganic bilayer, top-coated by UV-cured resin, greatly enhance the barrier performance, with a permeation rate of 3.79 × 10-5 g m-2 day-1 based on the change in the ohmic behavior of the calcium sensor at 20 °C and 50% relative humidity. Also, the permeation rate for 30 cycles of an 8/8 nm inorganic bilayer coated with UV resin was beyond the limited measurable range of the Ca test at 60 °C and 95% relative humidity. It has been found that such laminate films can effectively suppress the void defects of a single inorganic layer, and are significantly less sensitive against moisture permeation. This nanostructure, fabricated by an RF-sputtering process at room temperature, is verified as being useful for highly water-sensitive organic electronics fabricated on plastic substrates.

Original languageEnglish
Article number475203
Issue number47
Publication statusPublished - 2010 Nov 26

ASJC Scopus subject areas

  • Bioengineering
  • Chemistry(all)
  • Materials Science(all)
  • Mechanics of Materials
  • Mechanical Engineering
  • Electrical and Electronic Engineering


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