Identification of dislocations and their influence on the recombination of charge carriers in gallium nitride

A. V. Govorkov, A. Ya Polyakov, T. G. Yugova, N. B. Smirnov, E. A. Petrova, M. V. Mezhennyi, A. V. Markov, In-Hwan Lee, S. J. Pearton

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Abstract

The relation between the density of etch pits revealed in GaN by etching in a KOH/NaOH eutectic and the density of dislocations determined by transmission electron microscopy (TEM) is studied along with the relation between the density of dislocations and the density of dark spot defects observed in GaN by microcathodoluminescence (MCL) and electron-beam-induced current (EBIC). It is demonstrated that selective etching is a reliable rapid method for the determination of the type and density of dislocations in GaN in the range 106-108 cm-2, while MCL and EBIC can be used for the rapid nondestructive determination of the density of dislocations in the range 106-108 cm-2. It is also found that some deep electron and hole traps are related to dislocations.

Original languageEnglish
Pages (from-to)380-385
Number of pages6
JournalJournal of Surface Investigation
Volume1
Issue number4
DOIs
Publication statusPublished - 2007 Aug 1
Externally publishedYes

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ASJC Scopus subject areas

  • Surfaces, Coatings and Films

Cite this

Govorkov, A. V., Polyakov, A. Y., Yugova, T. G., Smirnov, N. B., Petrova, E. A., Mezhennyi, M. V., Markov, A. V., Lee, I-H., & Pearton, S. J. (2007). Identification of dislocations and their influence on the recombination of charge carriers in gallium nitride. Journal of Surface Investigation, 1(4), 380-385. https://doi.org/10.1134/S1027451007040039