Abstract
The influence of variations in the Si fin shape on the electrical properties of junctionless transistors (JLTs) was investigated through two-dimensional Poisson equation numerical simulations at different doping concentrations. Stronger gate coupling in a triangular fin channel was observed, arising from suppression of the variation in the conduction threshold voltage with increasing doping concentration, compared to JLTs with rectangular fin channels. The potential distribution in the channel cross-section shows a less varied potential at the bottom of a triangular channel than at the bottom of a rectangular channel, and supports the result that triangular channels are less sensitive to variations in channel doping concentration.
| Original language | English |
|---|---|
| Pages (from-to) | 50-54 |
| Number of pages | 5 |
| Journal | Microelectronic Engineering |
| Volume | 207 |
| DOIs | |
| Publication status | Published - 2019 Feb 15 |
Keywords
- 2D numerical simulation
- Channel doping concentration
- Fin cross-section shape
- Junctionless transistor
ASJC Scopus subject areas
- Electronic, Optical and Magnetic Materials
- Atomic and Molecular Physics, and Optics
- Condensed Matter Physics
- Surfaces, Coatings and Films
- Electrical and Electronic Engineering
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Cite this
Park, S. J., Jeon, D. Y., & Kim, G-T. (2019). Impact of fin shapes and channel doping concentrations on the operation of junctionless transistors. Microelectronic Engineering, 207, 50-54. https://doi.org/10.1016/j.mee.2019.01.003