Improving hardness of biomedical Co-Cr by deposition of dense and uniform TiN films using negative substrate bias during reactive sputtering

Vuong Hung Pham, Se Won Yook, Yuanlong Li, Gyuran Jeon, Jung Joong Lee, Hyoun Ee Kim, Young Hag Koh

Research output: Contribution to journalArticle

14 Citations (Scopus)

Abstract

This paper reports the deposition of a fully dense and uniform TiN film to improve the surface hardness of Co-Cr, particularly, by applying a negative substrate bias during reactive direct current (DC) sputtering. As the TiN film was deposited with a negative substrate bias voltage of 150 V, the microstructure of the films was shifted from a columnar to non-columnar one that was observed to have a dense, uniform and smooth surface. In addition, the preferred orientation was the (111) plane when the films were deposited with a negative substrate bias; however, the (200) plane when they were deposited without a substrate bias. The deposition of the dense and uniform TiN film resulted in a significant increase of the hardness of the Co-Cr. The TiN-deposited Co-Cr with a negative substrate bias showed a very high hardness of 44.7 ± 1.7 GPa, which was much higher than those of the bare Co-Cr (4.2 ± 0.3 GPa) and TiN-deposited Co-Cr without a negative substrate bias (23.6 ± 2.8 GPa).

Original languageEnglish
Pages (from-to)1707-1709
Number of pages3
JournalMaterials Letters
Volume65
Issue number11
DOIs
Publication statusPublished - 2011 Jun 15

Keywords

  • Biomaterial
  • Hardness
  • TiN coating

ASJC Scopus subject areas

  • Materials Science(all)
  • Condensed Matter Physics
  • Mechanics of Materials
  • Mechanical Engineering

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