Abstract
This paper reports the deposition of a fully dense and uniform TiN film to improve the surface hardness of Co-Cr, particularly, by applying a negative substrate bias during reactive direct current (DC) sputtering. As the TiN film was deposited with a negative substrate bias voltage of 150 V, the microstructure of the films was shifted from a columnar to non-columnar one that was observed to have a dense, uniform and smooth surface. In addition, the preferred orientation was the (111) plane when the films were deposited with a negative substrate bias; however, the (200) plane when they were deposited without a substrate bias. The deposition of the dense and uniform TiN film resulted in a significant increase of the hardness of the Co-Cr. The TiN-deposited Co-Cr with a negative substrate bias showed a very high hardness of 44.7 ± 1.7 GPa, which was much higher than those of the bare Co-Cr (4.2 ± 0.3 GPa) and TiN-deposited Co-Cr without a negative substrate bias (23.6 ± 2.8 GPa).
| Original language | English |
|---|---|
| Pages (from-to) | 1707-1709 |
| Number of pages | 3 |
| Journal | Materials Letters |
| Volume | 65 |
| Issue number | 11 |
| DOIs | |
| Publication status | Published - 2011 Jun 15 |
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Keywords
- Biomaterial
- Hardness
- TiN coating
ASJC Scopus subject areas
- Materials Science(all)
- Condensed Matter Physics
- Mechanical Engineering
- Mechanics of Materials
Cite this
Improving hardness of biomedical Co-Cr by deposition of dense and uniform TiN films using negative substrate bias during reactive sputtering. / Pham, Vuong Hung; Yook, Se Won; Li, Yuanlong; Jeon, Gyuran; Lee, Jung Joong; Kim, Hyoun Ee; Koh, Young-Hag.
In: Materials Letters, Vol. 65, No. 11, 15.06.2011, p. 1707-1709.Research output: Contribution to journal › Article
}
TY - JOUR
T1 - Improving hardness of biomedical Co-Cr by deposition of dense and uniform TiN films using negative substrate bias during reactive sputtering
AU - Pham, Vuong Hung
AU - Yook, Se Won
AU - Li, Yuanlong
AU - Jeon, Gyuran
AU - Lee, Jung Joong
AU - Kim, Hyoun Ee
AU - Koh, Young-Hag
PY - 2011/6/15
Y1 - 2011/6/15
N2 - This paper reports the deposition of a fully dense and uniform TiN film to improve the surface hardness of Co-Cr, particularly, by applying a negative substrate bias during reactive direct current (DC) sputtering. As the TiN film was deposited with a negative substrate bias voltage of 150 V, the microstructure of the films was shifted from a columnar to non-columnar one that was observed to have a dense, uniform and smooth surface. In addition, the preferred orientation was the (111) plane when the films were deposited with a negative substrate bias; however, the (200) plane when they were deposited without a substrate bias. The deposition of the dense and uniform TiN film resulted in a significant increase of the hardness of the Co-Cr. The TiN-deposited Co-Cr with a negative substrate bias showed a very high hardness of 44.7 ± 1.7 GPa, which was much higher than those of the bare Co-Cr (4.2 ± 0.3 GPa) and TiN-deposited Co-Cr without a negative substrate bias (23.6 ± 2.8 GPa).
AB - This paper reports the deposition of a fully dense and uniform TiN film to improve the surface hardness of Co-Cr, particularly, by applying a negative substrate bias during reactive direct current (DC) sputtering. As the TiN film was deposited with a negative substrate bias voltage of 150 V, the microstructure of the films was shifted from a columnar to non-columnar one that was observed to have a dense, uniform and smooth surface. In addition, the preferred orientation was the (111) plane when the films were deposited with a negative substrate bias; however, the (200) plane when they were deposited without a substrate bias. The deposition of the dense and uniform TiN film resulted in a significant increase of the hardness of the Co-Cr. The TiN-deposited Co-Cr with a negative substrate bias showed a very high hardness of 44.7 ± 1.7 GPa, which was much higher than those of the bare Co-Cr (4.2 ± 0.3 GPa) and TiN-deposited Co-Cr without a negative substrate bias (23.6 ± 2.8 GPa).
KW - Biomaterial
KW - Hardness
KW - TiN coating
UR - http://www.scopus.com/inward/record.url?scp=79953254531&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=79953254531&partnerID=8YFLogxK
U2 - 10.1016/j.matlet.2011.03.020
DO - 10.1016/j.matlet.2011.03.020
M3 - Article
AN - SCOPUS:79953254531
VL - 65
SP - 1707
EP - 1709
JO - Materials Letters
JF - Materials Letters
SN - 0167-577X
IS - 11
ER -