In Situ Nanolithography with Sub-10 nm Resolution Realized by Thermally Assisted Spin-Casting of a Self-Assembling Polymer

Jung Hye Lee, YongJoo Kim, Joong Yeon Cho, Se Ryeun Yang, Jong Min Kim, Soonmin Yim, Heon Lee, Yeon Sik Jung

Research output: Contribution to journalArticle

17 Citations (Scopus)

Abstract

In situ nanolithography is realized based on warm spin-casting of block copolymer solutions. This advancement is based on Si-containing block copolymers with an appropriate thermodynamic driving force for spontaneous phase-separation combined with the thermal assistance provided by slight temperature elevations during the spin-casting. Sub-10 nm half-pitch nanoscale patterns are produced within 30 s without a separate annealing process.

Original languageEnglish
Pages (from-to)4814-4822
Number of pages9
JournalAdvanced Materials
Volume27
Issue number33
DOIs
Publication statusPublished - 2015 Sep 1

Fingerprint

Nanolithography
Block copolymers
Polymers
Casting
Phase separation
Thermodynamics
Annealing
Temperature
Hot Temperature

Keywords

  • block copolymers
  • directed self-assembly
  • sub-10 nm
  • warm spin-casting

ASJC Scopus subject areas

  • Materials Science(all)
  • Mechanics of Materials
  • Mechanical Engineering

Cite this

In Situ Nanolithography with Sub-10 nm Resolution Realized by Thermally Assisted Spin-Casting of a Self-Assembling Polymer. / Lee, Jung Hye; Kim, YongJoo; Cho, Joong Yeon; Yang, Se Ryeun; Kim, Jong Min; Yim, Soonmin; Lee, Heon; Jung, Yeon Sik.

In: Advanced Materials, Vol. 27, No. 33, 01.09.2015, p. 4814-4822.

Research output: Contribution to journalArticle

Lee, Jung Hye ; Kim, YongJoo ; Cho, Joong Yeon ; Yang, Se Ryeun ; Kim, Jong Min ; Yim, Soonmin ; Lee, Heon ; Jung, Yeon Sik. / In Situ Nanolithography with Sub-10 nm Resolution Realized by Thermally Assisted Spin-Casting of a Self-Assembling Polymer. In: Advanced Materials. 2015 ; Vol. 27, No. 33. pp. 4814-4822.
@article{f473326d84a9414cbb12c7b51623d8bb,
title = "In Situ Nanolithography with Sub-10 nm Resolution Realized by Thermally Assisted Spin-Casting of a Self-Assembling Polymer",
abstract = "In situ nanolithography is realized based on warm spin-casting of block copolymer solutions. This advancement is based on Si-containing block copolymers with an appropriate thermodynamic driving force for spontaneous phase-separation combined with the thermal assistance provided by slight temperature elevations during the spin-casting. Sub-10 nm half-pitch nanoscale patterns are produced within 30 s without a separate annealing process.",
keywords = "block copolymers, directed self-assembly, sub-10 nm, warm spin-casting",
author = "Lee, {Jung Hye} and YongJoo Kim and Cho, {Joong Yeon} and Yang, {Se Ryeun} and Kim, {Jong Min} and Soonmin Yim and Heon Lee and Jung, {Yeon Sik}",
year = "2015",
month = "9",
day = "1",
doi = "10.1002/adma.201501363",
language = "English",
volume = "27",
pages = "4814--4822",
journal = "Advanced Materials",
issn = "0935-9648",
publisher = "Wiley-VCH Verlag",
number = "33",

}

TY - JOUR

T1 - In Situ Nanolithography with Sub-10 nm Resolution Realized by Thermally Assisted Spin-Casting of a Self-Assembling Polymer

AU - Lee, Jung Hye

AU - Kim, YongJoo

AU - Cho, Joong Yeon

AU - Yang, Se Ryeun

AU - Kim, Jong Min

AU - Yim, Soonmin

AU - Lee, Heon

AU - Jung, Yeon Sik

PY - 2015/9/1

Y1 - 2015/9/1

N2 - In situ nanolithography is realized based on warm spin-casting of block copolymer solutions. This advancement is based on Si-containing block copolymers with an appropriate thermodynamic driving force for spontaneous phase-separation combined with the thermal assistance provided by slight temperature elevations during the spin-casting. Sub-10 nm half-pitch nanoscale patterns are produced within 30 s without a separate annealing process.

AB - In situ nanolithography is realized based on warm spin-casting of block copolymer solutions. This advancement is based on Si-containing block copolymers with an appropriate thermodynamic driving force for spontaneous phase-separation combined with the thermal assistance provided by slight temperature elevations during the spin-casting. Sub-10 nm half-pitch nanoscale patterns are produced within 30 s without a separate annealing process.

KW - block copolymers

KW - directed self-assembly

KW - sub-10 nm

KW - warm spin-casting

UR - http://www.scopus.com/inward/record.url?scp=84940666281&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=84940666281&partnerID=8YFLogxK

U2 - 10.1002/adma.201501363

DO - 10.1002/adma.201501363

M3 - Article

AN - SCOPUS:84940666281

VL - 27

SP - 4814

EP - 4822

JO - Advanced Materials

JF - Advanced Materials

SN - 0935-9648

IS - 33

ER -