In Situ Nanolithography with Sub-10 nm Resolution Realized by Thermally Assisted Spin-Casting of a Self-Assembling Polymer

Jung Hye Lee, YongJoo Kim, Joong Yeon Cho, Se Ryeun Yang, Jong Min Kim, Soonmin Yim, Heon Lee, Yeon Sik Jung

Research output: Contribution to journalArticle

17 Citations (Scopus)

Abstract

In situ nanolithography is realized based on warm spin-casting of block copolymer solutions. This advancement is based on Si-containing block copolymers with an appropriate thermodynamic driving force for spontaneous phase-separation combined with the thermal assistance provided by slight temperature elevations during the spin-casting. Sub-10 nm half-pitch nanoscale patterns are produced within 30 s without a separate annealing process.

Original languageEnglish
Pages (from-to)4814-4822
Number of pages9
JournalAdvanced Materials
Volume27
Issue number33
DOIs
Publication statusPublished - 2015 Sep 1

Keywords

  • block copolymers
  • directed self-assembly
  • sub-10 nm
  • warm spin-casting

ASJC Scopus subject areas

  • Materials Science(all)
  • Mechanics of Materials
  • Mechanical Engineering

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