Inductively coupled plasma etching of hafnium-indium-zinc oxide using chlorine based gas mixtures

Yong Hee Choi, Ho Kyun Jang, Jun Eon Jin, Min Kyu Joo, Mingxing Piao, Jong Mok Shin, Jae Sung Kim, Junhong Na, Gyu-Tae Kim

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Engineering & Materials Science

Physics & Astronomy