Inductively-coupled-plasma reactive ion etching of ZnO using BCl 3-based plasmas and effect of the plasma treatment on Ti/Au ohmic contacts to ZnO

Han Ki Kim, J. W. Bae, K. K. Kim, S. J. Park, Tae Yeon Seong, I. Adesida

Research output: Contribution to journalArticle

37 Citations (Scopus)

Abstract

Inductively-coupled-plasma reactive ion etching (ICP-RIE) behaviour of ZnO has been investigated using BCl3-based plasmas; etch rates are studied as a function of plasma chemistry, ICP coil power and r.f. power. It is shown that compared with Cl2/Ar, Ar and CH4/H 2-based gas mixtures, pure BCl3 gas results in high etch rates, indicating that B and BCl radicals react with ZnO and form volatile compounds such as BxOy and/or BCl-O bond. It is further shown that the specific contact resistance as low as 1.5×10-5 Ωcm2 is obtained from Ti/Au contacts on the BCl3 plasma pretreated ZnO. Based on X-ray photoelectron spectroscopy results, possible mechanisms for the BCl3-pretreated improvement of ohmic properties are described.

Original languageEnglish
Pages (from-to)90-94
Number of pages5
JournalThin Solid Films
Volume447-448
DOIs
Publication statusPublished - 2004 Jan 30
Externally publishedYes

Fingerprint

Plasma etching
Ohmic contacts
Reactive ion etching
Inductively coupled plasma
electric contacts
etching
Plasmas
plasma chemistry
ions
Contact resistance
contact resistance
Gas mixtures
gas mixtures
coils
X ray photoelectron spectroscopy
Gases
photoelectron spectroscopy
gases
x rays

Keywords

  • BCl plasma
  • ICP-RIE
  • Ohmic contact
  • Surface roughness
  • ZnO

ASJC Scopus subject areas

  • Surfaces, Coatings and Films
  • Condensed Matter Physics
  • Surfaces and Interfaces

Cite this

Inductively-coupled-plasma reactive ion etching of ZnO using BCl 3-based plasmas and effect of the plasma treatment on Ti/Au ohmic contacts to ZnO. / Kim, Han Ki; Bae, J. W.; Kim, K. K.; Park, S. J.; Seong, Tae Yeon; Adesida, I.

In: Thin Solid Films, Vol. 447-448, 30.01.2004, p. 90-94.

Research output: Contribution to journalArticle

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AU - Seong, Tae Yeon

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