Inductively coupled plasma reactive ion etching of ZrO2: H solid electrolyte film in BCl3-based plasmas

Han Ki Kim, J. W. Bae, I. Adesida, T. Kim, Tae Yeon Seong, Joo Sun Kim, Y. S. Yoon

Research output: Contribution to journalArticle

Abstract

Inductively coupled plasma reactive ion etching (ICP-RIE) of ZrO 2:H solid electrolyte films was investigated using BCl 3-based plasma. ZrO2:H etch rates were studied as a function of the BCl3/Ar chemistry, ICP coil power, bias voltage, and working pressure. Scanning electron microscopy and atomic force microscopy were employed to characterize the etch rate and root-mean-square surface roughness of etched samples. It was found that in comparison with Cl2-based gas mixtures, pure BCl3 plasma results in a high etch rate of ZrO 2:H layer, suggesting an abundance of B and BCl radicals made up of a volatile compound such as BxOy, BCl-O, and Zr-Cl bond. In addition, Auger electron spectroscopy analysis exhibits that the BCl 3-based etching process produces no change in surface stoichiometry of the ZrO2:H films.

Original languageEnglish
JournalJournal of the Electrochemical Society
Volume152
Issue number5
DOIs
Publication statusPublished - 2005 Jun 20
Externally publishedYes

Fingerprint

Plasma etching
Reactive ion etching
Solid electrolytes
Inductively coupled plasma
solid electrolytes
etching
Plasmas
Auger electron spectroscopy
Bias voltage
Gas mixtures
Stoichiometry
Etching
Atomic force microscopy
ions
Surface roughness
Scanning electron microscopy
Auger spectroscopy
gas mixtures
electron spectroscopy
stoichiometry

ASJC Scopus subject areas

  • Electrochemistry
  • Surfaces, Coatings and Films
  • Surfaces and Interfaces

Cite this

Inductively coupled plasma reactive ion etching of ZrO2 : H solid electrolyte film in BCl3-based plasmas. / Kim, Han Ki; Bae, J. W.; Adesida, I.; Kim, T.; Seong, Tae Yeon; Kim, Joo Sun; Yoon, Y. S.

In: Journal of the Electrochemical Society, Vol. 152, No. 5, 20.06.2005.

Research output: Contribution to journalArticle

Kim, Han Ki ; Bae, J. W. ; Adesida, I. ; Kim, T. ; Seong, Tae Yeon ; Kim, Joo Sun ; Yoon, Y. S. / Inductively coupled plasma reactive ion etching of ZrO2 : H solid electrolyte film in BCl3-based plasmas. In: Journal of the Electrochemical Society. 2005 ; Vol. 152, No. 5.
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AU - Seong, Tae Yeon

AU - Kim, Joo Sun

AU - Yoon, Y. S.

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