Influence of air-oxidation on rectification in thiol-based molecular monolayers

Gyu Don Kong, Hyo Jae Yoon

Research output: Contribution to journalArticlepeer-review

25 Citations (Scopus)


Spontaneous structural degradation processes occurring on metallic surfaces upon exposure to air-self-passivation-are well known for conventional silicon-based electronic materials; however, the effect of the analogous process for organic materials inside molecular electronic devices on their electrical behavior is rarely understood. Here, we show the influence of air-oxidation on molecular rectification in large-area junctions formed from a self-assembled monolayer (SAM) comprising 2,2′-bipyridyl terminated n-alkanethiolate. Upon exposure to air, the rectification ratio decreases as a function of air-exposure time and disappears in ∼3 h. Structural analyses of the SAM using X-ray photoelectron spectroscopy and wet electrochemistry, as well as several physical-organic studies indicate that the decrease of rectification over time stems from structural degradation, facilitated by light, of the thiolate anchoring group of the SAM.

Original languageEnglish
Pages (from-to)G115-G121
JournalJournal of the Electrochemical Society
Issue number9
Publication statusPublished - 2016

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Renewable Energy, Sustainability and the Environment
  • Surfaces, Coatings and Films
  • Electrochemistry
  • Materials Chemistry


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