Influence of High-Energy Proton Irradiation on β-Ga2O3 Nanobelt Field-Effect Transistors

Gwangseok Yang, Soohwan Jang, Fan Ren, Stephen J. Pearton, Ji Hyun Kim

Research output: Contribution to journalArticle

43 Citations (Scopus)

Abstract

The robust radiation resistance of wide-band gap materials is advantageous for space applications, where the high-energy particle irradiation deteriorates the performance of electronic devices. We report on the effects of proton irradiation of β-Ga2O3 nanobelts, whose energy band gap is ∼4.85 eV at room temperature. Back-gated field-effect transistor (FET) based on exfoliated quasi-two-dimensional β-Ga2O3 nanobelts were exposed to a 10 MeV proton beam. The proton-dose- and time-dependent characteristics of the radiation-damaged FETs were systematically analyzed. A 73% decrease in the field-effect mobility and a positive shift of the threshold voltage were observed after proton irradiation at a fluence of 2 × 1015 cm-2. Greater radiation-induced degradation occurs in the conductive channel of the β-Ga2O3 nanobelt than at the contact between the metal and β-Ga2O3. The on/off ratio of the exfoliated β-Ga2O3 FETs was maintained even after proton doses up to 2 × 1015 cm-2. The radiation-induced damage in the β-Ga2O3-based FETs was significantly recovered after rapid thermal annealing at 500 °C. The outstanding radiation durability of β-Ga2O3 renders it a promising building block for space applications.

Original languageEnglish
Pages (from-to)40471-40476
Number of pages6
JournalACS Applied Materials and Interfaces
Volume9
Issue number46
DOIs
Publication statusPublished - 2017 Nov 22

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Keywords

  • gallium oxide
  • proton irradiation
  • thermal annealing
  • two-dimensional materials
  • wide-band gap semiconductors

ASJC Scopus subject areas

  • Materials Science(all)

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