Influence of surface roughness on the electric conduction process in amorphous Ta2O5 thin films

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Abstract

Amorphous Ta2O5 thin films were deposited by radio-frequency magnetron sputtering at the substrate temperatures of 100, 200, and 300 °C, respectively. The electrical properties of Ta2O5 thin films were investigated as a function of substrate temperature and film thickness. The leakage current of the Ta2O5 films was in the order of 10-5 to 10-6 A/cm2 for an applied field of 1 MV/cm. The charge storage capacitances (εEbreakdown) were 7.7 (100 °C), 7.9 (200 °C), and 3.7 (300 °C) μC/cm2. Most of the electrical analyses were performed with the data obtained for the Ta2O5 thin films deposited at 200 °C substrate temperature because they showed optimum electrical properties. The dominant conduction mechanism changed from Schottky emission current at low field to Poole-Frenkel current at the high field. With increasing film thickness, the surface roughness increased, whereas the transition fields from the electrode-limited current to the bulk-limited current process decreased. To verify the effect of this surface roughness on the electrical conduction mechanism, a two-dimensional numerical simulator, MEDICI, was used to simulate the electric field distribution at the bulk region of the thin film and the interface region between the thin film and electrode.

Original languageEnglish
Pages (from-to)3398-3402
Number of pages5
JournalJournal of the Electrochemical Society
Volume146
Issue number9
DOIs
Publication statusPublished - 1999 Sep 1

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ASJC Scopus subject areas

  • Electrochemistry
  • Surfaces, Coatings and Films
  • Surfaces and Interfaces

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