Influences of ambient gases upon emission characteristics of Mo-FEAs during frit sealing process

Hoon Kim, Byeong Kwon Ju, Kwang Bae Lee, Moon Sik Kang, Jin Jang, Myung Hwan Oh

Research output: Chapter in Book/Report/Conference proceedingConference contribution

2 Citations (Scopus)

Abstract

The influences of ambient gases on the packaging of Spindt-type Mo-field emitter arrays (FEAs) at the atmosphere were studied through electrical field emission characteristics and Mo surface analysis according to various ambient gases (N2, AR and air). And electrical field emission characteristics in ultra high vacuum chamber and Mo surface analysis were performed after breaking the sealing lines to expose the FEAs. We can obtain increased electron emission current for each pixel by using Ar gas when compared with other gases during frit process.

Original languageEnglish
Title of host publicationProceedings of the IEEE International Vacuum Microelectronics Conference, IVMC
Place of PublicationPiscataway, NJ, United States
PublisherIEEE
Pages67-68
Number of pages2
Publication statusPublished - 1998 Dec 1
Externally publishedYes
EventProceedings of the 1998 11th International Vacuum Microelectronics Conference, IVMC - Asheville, NC, USA
Duration: 1998 Jul 191998 Jul 24

Other

OtherProceedings of the 1998 11th International Vacuum Microelectronics Conference, IVMC
CityAsheville, NC, USA
Period98/7/1998/7/24

Fingerprint

frit
sealing
emitters
gases
field emission
vacuum chambers
packaging
electron emission
ultrahigh vacuum
pixels
atmospheres
air

ASJC Scopus subject areas

  • Surfaces and Interfaces

Cite this

Kim, H., Ju, B. K., Lee, K. B., Kang, M. S., Jang, J., & Oh, M. H. (1998). Influences of ambient gases upon emission characteristics of Mo-FEAs during frit sealing process. In Proceedings of the IEEE International Vacuum Microelectronics Conference, IVMC (pp. 67-68). Piscataway, NJ, United States: IEEE.

Influences of ambient gases upon emission characteristics of Mo-FEAs during frit sealing process. / Kim, Hoon; Ju, Byeong Kwon; Lee, Kwang Bae; Kang, Moon Sik; Jang, Jin; Oh, Myung Hwan.

Proceedings of the IEEE International Vacuum Microelectronics Conference, IVMC. Piscataway, NJ, United States : IEEE, 1998. p. 67-68.

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Kim, H, Ju, BK, Lee, KB, Kang, MS, Jang, J & Oh, MH 1998, Influences of ambient gases upon emission characteristics of Mo-FEAs during frit sealing process. in Proceedings of the IEEE International Vacuum Microelectronics Conference, IVMC. IEEE, Piscataway, NJ, United States, pp. 67-68, Proceedings of the 1998 11th International Vacuum Microelectronics Conference, IVMC, Asheville, NC, USA, 98/7/19.
Kim H, Ju BK, Lee KB, Kang MS, Jang J, Oh MH. Influences of ambient gases upon emission characteristics of Mo-FEAs during frit sealing process. In Proceedings of the IEEE International Vacuum Microelectronics Conference, IVMC. Piscataway, NJ, United States: IEEE. 1998. p. 67-68
Kim, Hoon ; Ju, Byeong Kwon ; Lee, Kwang Bae ; Kang, Moon Sik ; Jang, Jin ; Oh, Myung Hwan. / Influences of ambient gases upon emission characteristics of Mo-FEAs during frit sealing process. Proceedings of the IEEE International Vacuum Microelectronics Conference, IVMC. Piscataway, NJ, United States : IEEE, 1998. pp. 67-68
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