Abstract
We report the morphology, texture, mechanical properties of Ni films with nanosized grains prepared by electrodeposition as a function of current density. With an increase in current density, the morphology of the nanostructured films was greatly affected and the textures changed from face-centered cubic (1 1 1)- to (2 0 0)-orientation. Consequently, the textural and microstructural alteration exerted strong influence on the hardness of the films, leading to decrease in the hardness (in particular, the inverse Hall-Petch relation) as current density increased, attributed to the distribution of colonies of grain agglomerate and the variation of directional tensile strength.
| Original language | English |
|---|---|
| Pages (from-to) | 57-59 |
| Number of pages | 3 |
| Journal | Current Applied Physics |
| Volume | 10 |
| Issue number | 1 |
| DOIs | |
| Publication status | Published - 2010 Jan 1 |
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Keywords
- Electrodeposition
- Hardness
- Magnetism
- Texture
- Thin films
ASJC Scopus subject areas
- Materials Science(all)
- Physics and Astronomy(all)
Cite this
Inverse Hall-Petch relation of nanostructured Ni films prepared by electrodeposition. / Cho, Moon Kyu; Cho, Jin Woo; Wu, Jun Hua; Cho, Ji Ung; Choi, Young Jin; Kim, Young-geun.
In: Current Applied Physics, Vol. 10, No. 1, 01.01.2010, p. 57-59.Research output: Contribution to journal › Article
}
TY - JOUR
T1 - Inverse Hall-Petch relation of nanostructured Ni films prepared by electrodeposition
AU - Cho, Moon Kyu
AU - Cho, Jin Woo
AU - Wu, Jun Hua
AU - Cho, Ji Ung
AU - Choi, Young Jin
AU - Kim, Young-geun
PY - 2010/1/1
Y1 - 2010/1/1
N2 - We report the morphology, texture, mechanical properties of Ni films with nanosized grains prepared by electrodeposition as a function of current density. With an increase in current density, the morphology of the nanostructured films was greatly affected and the textures changed from face-centered cubic (1 1 1)- to (2 0 0)-orientation. Consequently, the textural and microstructural alteration exerted strong influence on the hardness of the films, leading to decrease in the hardness (in particular, the inverse Hall-Petch relation) as current density increased, attributed to the distribution of colonies of grain agglomerate and the variation of directional tensile strength.
AB - We report the morphology, texture, mechanical properties of Ni films with nanosized grains prepared by electrodeposition as a function of current density. With an increase in current density, the morphology of the nanostructured films was greatly affected and the textures changed from face-centered cubic (1 1 1)- to (2 0 0)-orientation. Consequently, the textural and microstructural alteration exerted strong influence on the hardness of the films, leading to decrease in the hardness (in particular, the inverse Hall-Petch relation) as current density increased, attributed to the distribution of colonies of grain agglomerate and the variation of directional tensile strength.
KW - Electrodeposition
KW - Hardness
KW - Magnetism
KW - Texture
KW - Thin films
UR - http://www.scopus.com/inward/record.url?scp=69249229731&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=69249229731&partnerID=8YFLogxK
U2 - 10.1016/j.cap.2009.03.026
DO - 10.1016/j.cap.2009.03.026
M3 - Article
AN - SCOPUS:69249229731
VL - 10
SP - 57
EP - 59
JO - Current Applied Physics
JF - Current Applied Physics
SN - 1567-1739
IS - 1
ER -