Investigation of addition of silicon on the electrical properties of low temperature solution processed SiInZnO thin film transistor

Jun Young Choi, Sangsig Kim, Sang Yeol Lee

Research output: Contribution to journalArticle

7 Citations (Scopus)

Abstract

Abstract: Silicon indium zinc oxide (SIZO) TFTs are prepared by solution process at low temperature. The SIZO TFTs were investigated with respect to optical, electrical properties and structure. The effect of silicon contents into an IZO TFTs were investigated as a function of silicon concentration from 0.01 to 0.4 mol%. The silicon has more oxidized than In or Zn due to the low standard electrode potential. As Si concentration increased, the threshold voltage shifted toward positive direction and the off current decreased, systematically.

Graphical abstract: Silicon indium zinc oxide (SIZO) TFTs are prepared by solution process. Carrier generation originated from the oxygen vacancy could be modified by adding Si since Si could be an oxygen vacancy suppressor. This is also related with the origin of defect state which was observed to be involved with the creation of oxygen vacancies. The O<inf>II</inf>/O<inf>tot</inf> ratio was decreased as increase silicon doping contents, indicating that the addition of Si atoms decreases the carrier concentration due to the lack of oxygen vacancy act as major carrier in oxide TFTs. The Si molar ratios in the solution can effectively control carrier concentration and saturation mobility.[Figure not available: see fulltext.]

Original languageEnglish
Pages (from-to)482-487
Number of pages6
JournalJournal of Sol-Gel Science and Technology
Volume74
Issue number2
DOIs
Publication statusPublished - 2015 May 1

Keywords

  • Oxide thin film transistors
  • SiInZnO
  • Solution process

ASJC Scopus subject areas

  • Chemistry(all)
  • Condensed Matter Physics
  • Biomaterials
  • Ceramics and Composites
  • Electronic, Optical and Magnetic Materials
  • Materials Chemistry

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