Investigation of interface characteristics of Al2O3/Si under various O2 plasma exposure times during the deposition of Al2O3 by PA-ALD

Kwan Hong Min, Sungjin Choi, Myeong Sang Jeong, Min Gu Kang, Sungeun Park, Hee eun Song, Jeong In Lee, Donghwan Kim

Research output: Contribution to journal › Article › peer-review

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Chemical Compounds

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