Investigations on the influence of masks on the nature of selective area epitaxy

J. Thompson, A. K. Wood, N. Carr, P. M. Charles, A. J. Moseley, R. Pritchard, B. Hamilton, A. Chew, D. E. Sykes, Tae Yeon Seong

Research output: Contribution to journalArticle

7 Citations (Scopus)

Abstract

We have evaluated the structural and optical properties of epitaxial layers of GaInAs and GaInAsP grown on InP substrates patterned with SiO2 masks. The effect of the mask on the MOVPE grown material surrounding and underlying the mask, and the device performance from this material has been assessed in detail for the first time.

Original languageEnglish
Pages (from-to)227-234
Number of pages8
JournalJournal of Crystal Growth
Volume124
Issue number1-4
Publication statusPublished - 1992 Nov 1
Externally publishedYes

Fingerprint

Epitaxial growth
epitaxy
Masks
masks
Metallorganic vapor phase epitaxy
Epitaxial layers
Structural properties
Optical properties
optical properties
Substrates

ASJC Scopus subject areas

  • Condensed Matter Physics

Cite this

Thompson, J., Wood, A. K., Carr, N., Charles, P. M., Moseley, A. J., Pritchard, R., ... Seong, T. Y. (1992). Investigations on the influence of masks on the nature of selective area epitaxy. Journal of Crystal Growth, 124(1-4), 227-234.

Investigations on the influence of masks on the nature of selective area epitaxy. / Thompson, J.; Wood, A. K.; Carr, N.; Charles, P. M.; Moseley, A. J.; Pritchard, R.; Hamilton, B.; Chew, A.; Sykes, D. E.; Seong, Tae Yeon.

In: Journal of Crystal Growth, Vol. 124, No. 1-4, 01.11.1992, p. 227-234.

Research output: Contribution to journalArticle

Thompson, J, Wood, AK, Carr, N, Charles, PM, Moseley, AJ, Pritchard, R, Hamilton, B, Chew, A, Sykes, DE & Seong, TY 1992, 'Investigations on the influence of masks on the nature of selective area epitaxy', Journal of Crystal Growth, vol. 124, no. 1-4, pp. 227-234.
Thompson J, Wood AK, Carr N, Charles PM, Moseley AJ, Pritchard R et al. Investigations on the influence of masks on the nature of selective area epitaxy. Journal of Crystal Growth. 1992 Nov 1;124(1-4):227-234.
Thompson, J. ; Wood, A. K. ; Carr, N. ; Charles, P. M. ; Moseley, A. J. ; Pritchard, R. ; Hamilton, B. ; Chew, A. ; Sykes, D. E. ; Seong, Tae Yeon. / Investigations on the influence of masks on the nature of selective area epitaxy. In: Journal of Crystal Growth. 1992 ; Vol. 124, No. 1-4. pp. 227-234.
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