Issues on nanoimprint lithography with a single-layer resist structure

G. Y. Jung, W. Wu, S. Ganapathiappan, D. A.A. Ohlberg, M. Saif Islam, X. Li, D. L. Olynick, H. Lee, Y. Chen, S. Y. Wang, W. M. Tong, R. S. Williams

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Chemical Compounds

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