Large-area printed broadband membrane reflectors by laser interference lithography

Jung Hun Seo; Jungho Park; Deyin Zhao; Hongjun Yang; Weidong Zhou; Byeong Kwon Ju; Zhenqiang Ma

doi:10.1109/JPHOT.2012.2236545

Large-area printed broadband membrane reflectors by laser interference lithography

Jung Hun Seo, Jungho Park, Deyin Zhao, Hongjun Yang, Weidong Zhou, Byeong Kwon Ju, Zhenqiang Ma

School of Electrical Engineering

Research output: Contribution to journal › Article › peer-review

25 Citations (Scopus)

Abstract

We report here large-area broadband photonic crystal membrane reflectors (MRs) on glass substrates based on laser interference lithography (LIL) patterning and elastic stamp membrane transfer printing techniques. High-reflectivity broadband MRs on glass were realized with measured reflectivity of 95% around 1300 nm and a bandwidth of about 100 nm. Large-area nanopattern uniformity was experimentally verified with measured reflectivity from multiple locations of the large-area MRs. The work could lead to fabrication of the large-area high-performance MR at low cost with high throughput. The reflectors can be used in many types of optoelectronic and photonic devices.

Original language	English
Article number	6449313
Journal	IEEE Photonics Journal
Volume	5
Issue number	1
DOIs	https://doi.org/10.1109/JPHOT.2012.2236545
Publication status	Published - 2013

Keywords

Broadband membrane reflectors (MRs)
Laser interference lithography (LIL)
Silicon nanomembrane
Transfer printing

ASJC Scopus subject areas

Atomic and Molecular Physics, and Optics
Electrical and Electronic Engineering

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10.1109/JPHOT.2012.2236545

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title = "Large-area printed broadband membrane reflectors by laser interference lithography",

abstract = "We report here large-area broadband photonic crystal membrane reflectors (MRs) on glass substrates based on laser interference lithography (LIL) patterning and elastic stamp membrane transfer printing techniques. High-reflectivity broadband MRs on glass were realized with measured reflectivity of 95% around 1300 nm and a bandwidth of about 100 nm. Large-area nanopattern uniformity was experimentally verified with measured reflectivity from multiple locations of the large-area MRs. The work could lead to fabrication of the large-area high-performance MR at low cost with high throughput. The reflectors can be used in many types of optoelectronic and photonic devices.",

keywords = "Broadband membrane reflectors (MRs), Laser interference lithography (LIL), Silicon nanomembrane, Transfer printing",

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AU - Seo, Jung Hun

AU - Park, Jungho

AU - Zhao, Deyin

AU - Yang, Hongjun

AU - Zhou, Weidong

AU - Ju, Byeong Kwon

AU - Ma, Zhenqiang

PY - 2013

Y1 - 2013

N2 - We report here large-area broadband photonic crystal membrane reflectors (MRs) on glass substrates based on laser interference lithography (LIL) patterning and elastic stamp membrane transfer printing techniques. High-reflectivity broadband MRs on glass were realized with measured reflectivity of 95% around 1300 nm and a bandwidth of about 100 nm. Large-area nanopattern uniformity was experimentally verified with measured reflectivity from multiple locations of the large-area MRs. The work could lead to fabrication of the large-area high-performance MR at low cost with high throughput. The reflectors can be used in many types of optoelectronic and photonic devices.

AB - We report here large-area broadband photonic crystal membrane reflectors (MRs) on glass substrates based on laser interference lithography (LIL) patterning and elastic stamp membrane transfer printing techniques. High-reflectivity broadband MRs on glass were realized with measured reflectivity of 95% around 1300 nm and a bandwidth of about 100 nm. Large-area nanopattern uniformity was experimentally verified with measured reflectivity from multiple locations of the large-area MRs. The work could lead to fabrication of the large-area high-performance MR at low cost with high throughput. The reflectors can be used in many types of optoelectronic and photonic devices.

KW - Broadband membrane reflectors (MRs)

KW - Laser interference lithography (LIL)

KW - Silicon nanomembrane

KW - Transfer printing

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Large-area printed broadband membrane reflectors by laser interference lithography

Abstract

Keywords

ASJC Scopus subject areas

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